Piezo position control flow ratio control

5. The method of claim 1, wherein the generating of the model of fluid conductance ratios is further based on a plurality of ratio setpoints, and wherein the plurality of ratio setpoints are based on the first plurality of valve positions and the second plurality of valve positions.

7. The method of claim 1, wherein the causing of the first valve to be in the first valve position and the second valve to be in the second valve position is to clear the first pipe and the second pipe of fluid in anticipation of the process of the recipe.

8. The method of claim 1, wherein the causing of the first valve to be in the first valve position and the second valve to be in the second valve position is to preposition the first valve and the second valve for the process of the recipe.

12. The system of claim 10 further comprising a fluid manifold configured to control fluid flow rate from the fluid source, wherein the processing device is to cause the fluid manifold to provide a corresponding fluid flow rate.

13. The system of claim 11, wherein the first pipe is fluidly coupled to a first chamber of a substrate processing system, the second pipe is fluidly coupled to a second chamber of the substrate processing system, and the third pipe is fluidly coupled to a third chamber of the substrate processing system.

14. The system of claim 10, wherein the first pipe is fluidly coupled to a first zone in a first chamber and the second pipe is fluidly coupled to a second zone in the first chamber.