A control device includes a reception unit configured to receive a film characteristic at a plurality of positions of a film formed on a substrate by a film forming processing based on a processing recipe, an optimization processing unit configured to execute an optimization calculation of the processing recipe based on the film characteristic, a diagnosis unit configured to diagnose a validity of an in-plane shape of the film characteristic based on the film characteristic, and a determination unit configured to determine whether or not to notify a user of an encouraging action based on a diagnosis result by the diagnosis unit.
Legal claims defining the scope of protection, as filed with the USPTO.
2. The control device according to claim 1, wherein the plurality of positions include the center or proximate to the center of the substrate, the edges of the substrate, and positions intermediate to the center and one of the respective edges, along the plane of the substrate.
3. The control device according to claim 1, wherein the diagnosis circuitry diagnoses the validity of the in-plane shape based on an in-plane uniformity of the film characteristic, the in-plane uniformity of the film characteristic predicted when the film is formed by the processing recipe for which the optimization calculation has been executed, and a target in plane uniformity of the film characteristic.
4. The control device according to claim 1, wherein the optimization processing circuitry executes the optimization calculation of the processing recipe based on the plurality of measurements of the film characteristic and a model indicating an influence of a temperature of the substrate on the film characteristic.
8. The control device according to claim 1, wherein the film characteristic is a film thickness.
11. The control device according to claim 1, wherein the processing recipe and the subsequent processing recipe are either: 1) a same processing recipe, or 2) different processing recipes.
12. The system according to claim 9, wherein the processing recipe and the subsequent processing recipe are either: 1) a same processing recipe, or 2) different processing recipes.
13. The control method according to claim 10, wherein the processing recipe and the subsequent processing recipe are either: 1) a same processing recipe, or 2) different processing recipes.
14. The control device according to claim 1, wherein the plurality of positions, for analyzing the magnitude relation between at least two measurements, include predetermined positions along the plane of the substrate.
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July 7, 2021
December 10, 2024
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