A plasma treatment apparatus includes a light generator that generates light, a chamber that receives the light generated from the light generator, an optical element provided between the light generator and the chamber, a light detector that detects the light reflected in the chamber, and a controller connected to the light generator and the light detector. The chamber includes an electrostatic chuck provided in a lower portion of the chamber, an edge ring provided around the electrostatic chuck, an outer wall for sealing an inner space of the chamber, and a gas supply that injects a process gas into the chamber. The optical element branches the generated light to irradiate branched light to different regions of the chamber.
Legal claims defining the scope of protection, as filed with the USPTO.
2. The plasma treatment apparatus of claim 1, wherein the light generated by the light generator has a frequency of about 0.1 THz to about 1 THz.
3. The plasma treatment apparatus of claim 1, wherein the light generator and the optical element are under the chamber.
4. The plasma treatment apparatus of claim 3, wherein the optical element comprises a plurality of optical elements, and each of the plurality of optical elements comprises a simple mirror, a dichroic mirror, or a beam splitter.
5. The plasma treatment apparatus of claim 4, wherein at least one of the plurality of optical elements comprises a driver, and the at least one of the plurality of optical elements is movable in a horizontal direction parallel to a bottom surface of the chamber by the driver.
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August 5, 2021
December 17, 2024
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