To provide a mechanism for performing environment control in a plant cultivation device and process control regarding to a work process for cultivating a plant. A plant cultivation device includes a plurality of sensors for monitoring a growing condition of a plant to be cultivated; an environment controlling unit for controlling an environment which is a condition of at least one of light, air, water, and space in the plant cultivation device; and a process controlling unit for controlling a work process for cultivating the plant.
Legal claims defining the scope of protection, as filed with the USPTO.
. A plant cultivation device, comprising:
. The plant cultivation device as recited in, wherein a plurality of basic recipes defined for respective plants to be cultivated are stored in a separate management server, and wherein the environment controlling unit controls the environment in the plant cultivation device according to the basic recipe received from the separate management server, corresponding to the plant to be cultivated.
. The plant cultivation device as recited in, wherein a plurality of work recipes defined for respective plants to be cultivated are stored in a separate management server, and wherein the process controlling unit controls the work process for cultivating the plant, according to the work recipe received from the separate management server, corresponding to the plant to be cultivated.
. The plant cultivation device as recited in, wherein the predetermined start time is either a start time for cultivating the plant or a sowing time for the plant.
. The plant cultivation device as recited in, wherein the work recipe defines, for each of work process to be performed, a constraint condition for a work environment to be satisfied.
. The plant cultivation device as recited in, wherein the constraint condition for the work environment is an allowable variation range from the environment in the plant cultivation device which is controlled according to environment value information of the basic recipe.
. The plant cultivation device as recited in, wherein the environmental value information relates to a temperature, and the constraint condition for the work environment relates to an allowable variation range of a temperature from a temperature in the plant cultivation device which is controlled according to the environmental value information.
. The plant cultivation device as recited in, wherein the environmental value information relates to a humidity, and the constraint condition for the work environment relates to an allowable variation range of a humidity from a humidity in the plant cultivation device which is controlled according to the environmental value information.
. The plant cultivation device as recited in, wherein the environmental value information relates to a carbon dioxide concentration, and the constraint condition for the work environment relates to an allowable variation range of a carbon dioxide concentration from a carbon dioxide concentration in the plant cultivation device which is controlled according to the environmental value information.
. The plant cultivation device as recited in, wherein the process controlling unit displays the constraint condition for the work environment to be satisfied when the work process is performed, together with the work process defined in the work recipe.
. The plant cultivation device as recited in, wherein the process controlling unit displays an alert when the constraint condition for the work environment to be satisfied in executing the work process is not satisfied.
. The plant cultivation device as recited in, wherein the plant cultivation device has a cultivation facility, which is provided with the plant cultivation device inside, the cultivation facility manages the work environment in an external work space which is outside the plant cultivation device and inside of the cultivation facility, wherein the basic recipe defines environmental value information for the inside of the plant cultivation device, and wherein the work recipe defines the work environment in the external work space outside the plant cultivation device and inside of the cultivation facility to be satisfied for a case that the plant to be cultivated is taken out from the plant cultivation device to the external work space outside the plant cultivation device and inside of the cultivation facility.
. The plant cultivation device as recited in, wherein the plant cultivation device includes a growing condition monitoring unit for displaying the growing condition of the plant to be cultivated.
. A non-transitory computer readable recording medium storing program for causing a plant cultivation device, wherein the plant cultivation device being configured to acquire information from a plurality of sensors for monitoring a growing condition of a plant to be cultivated, to function as:
. A method for cultivating a plant in a plant cultivation device, comprising the steps of:
. The method for cultivating the plant as recited in, wherein the environment in the plant cultivation device is controlled according to a basic recipe for defining environmental value information, wherein the environmental value information relates to a condition of at least one of light, air, water, and space to be applied for cultivating the plant.
. The method for cultivating the plant as recited in, wherein the work process for cultivating the plant is controlled according to a work recipe for defining the work process for cultivating the plant, wherein the work process is defined to be performed according to at least one of an elapsed time from a predetermined start time, a condition of the plant cultivation device, and a change in the environment.
. A plant produced by a method for cultivating a plant in a plant cultivation device, wherein the method for cultivating the plant comprises the steps of:
. The plant cultivation device as recited in, wherein the cultivation facility controls the work environment which is at least one of a light wavelength, a photon flux density, a temperature, a humidity, a carbon dioxide concentration, ion concentrations, an air flow in the external work space outside the plant cultivation device and inside of the cultivation facility.
Complete technical specification and implementation details from the patent document.
This application is a National Stage of International Application No. PCT/JP2021/015081, filed Apr. 9, 2021, which in turn claims the benefit of Japanese Patent Application 2020-071382, filed Apr. 11, 2020. The entire disclosures of the above applications are hereby incorporated herein by reference.
The present invention relates to a device and a method for cultivating a plant.
With respect to the background art, there is a patent document, JP2008-61575A (Patent Document 1) on this technical field. The following is described in this publication. “A plant management deviceis provided to prompt proper management of cultivation by informing a user of a cultivation condition according to a growing environment for each plant. The plant management deviceincludes a temperature detecting unit, a humidity detecting unit, and an illumination detecting unitfor detecting various values indicating conditions of a peripheral environment of plant; a first memory unitfor storing various values detected from the temperature detecting unit, the humidity detecting unit, and the illumination detecting unit; and a CPU (Central Processing Unit)for discriminating an existence or nonexistence of abnormality in the cultivation condition of the plant and a problem tendency based on a predetermined decision reference information and the various values detected from the temperature detecting unit, the humidity detecting unit, and the illumination detecting unit; an indicating lampand a sounding unitfor informing the cultivation condition of the plant according to the determined result of the cultivation condition of the plant by the CPU; and a first communication unitfor sending various detected values stored in the first memory unitto an external deviceaccording to a power supply generated by an induced electromagnetic field or electric wave supplied from the external device(i.e. the abstract).”
A mechanism for informing a user about a cultivation condition in a plant cultivation device is disclosed in the Patent Document 1. However, a mechanism for performing a process control regarding to a work process for cultivating a plant is not disclosed in the plant cultivation device of the Patent Document 1.
Accordingly, it is the object of the invention to provide a mechanism for performing the both of an environmental control in a plant cultivation device and a process control regarding to a work process for cultivating a plant.
In addition, a mechanism for performing the environmental control and the process control in the plant cultivation device according to a recipe received from a management server is provided.
For example, by employing configurations described in the claims, the above-mentioned problems are solved.
According to the present application, there are a plurality of ways for solving the problems. For example, the present application provides a plant cultivation device (or a device for cultivating plant) which includes a plurality of sensors for monitoring a growing condition of a plant to be cultivated; an environment controlling unit for controlling an environment which is a condition of at least one of light, air, water, and space in the plant cultivation device; and a process controlling unit for controlling a work process for cultivating the plant.
According to the present invention, it becomes possible to provide a mechanism for performing the both of an environmental control in the plant cultivation device and a process control regarding to a work process for cultivating a plant.
Also, it becomes possible to provide a mechanism for performing the environmental control and the process control in the plant cultivation device according to a recipe received from a management server.
The problems, configurations and effects other than the above will be clarified by the following description of the embodiment.
Further areas of applicability will become apparent from the description provided herein. It should be understood that the description and specific examples are intended for purposes of illustration only and are not intended to limit the scope of the present disclosure.
The following detailed description and appended drawings describe and illustrate various embodiments of the invention. The description and drawings serve to enable one skilled in the art to make and use the invention, and are not intended to limit the scope of the invention in any manner. In respect of the methods disclosed, the steps presented are exemplary in nature, and thus, the order of the steps is not necessary or critical unless otherwise disclosed.
A cultivation device of the present invention is configured to be used in a plant factory depending on an artificial light source. In a case of a plant factory having a large scale of production, it has been known that controlling a cultivation environment is difficult. The cultivation device of the present invention is configured to be used suitably in such a plant factory.
A cultivation deviceA in relation with a first embodiment will be described with referring to.
is an example of a functional diagram illustrating a configuration of a cultivation deviceA of the invention.
The cultivation device (or a device for cultivating plant)A is configured to include a cultivation roomA, a plurality of cultivation chambersA, an air circulation device (or a device for circulating an air), a nourishing solution circulation device (or a device for circulating a nourishing solution), an operating unit, a controlling unit, and a displaying unit.
As depicted in, the cultivation roomA has an outer wall formed in a rectangular parallelopiped shape for closing or sealing the inside thereof, by which the cultivation roomA is made to be able to maintain its cultivation environment independent from an environment (for example, a temperature and/or a humidity) of a work room of a plant factory in which the cultivation deviceA is disposed. As a material of the outer wall, it is preferable to use a heat insulating material so as to be less susceptible to an environmental influence of the work room which is outside of the cultivation roomA. Referring to, the cultivation deviceA is depicted under a condition where the outer wall of the cultivation roomA is removed.
is an example of a sectional view of the cultivation roomA according to the present invention as seen from a longitudinal direction.
As depicted in, a plurality of cultivation chambersA are formed by partitioning the cultivation roomA by shelf boardswhich are located at predetermined intervals in an up-and-down direction. Each of the cultivation chambersA has a substantially rectangular parallelepiped shape. The plurality of cultivation chamberA may be configured by providing an exterior material to a conventionally known multistage type cultivation shelf. In the embodiment, it is configured by providing the exterior material (i.e. the outer wall of the cultivation roomA) to a five-stage type cultivation shelf.
In each of the cultivation chambersA, a plurality of nourishing solution traysand cultivation platesare provided (c.f.). In this case, a lateral direction of the nourishing solution traysand a lateral direction of the cultivation platesare directed along a longitudinal direction of the cultivation chamberA (c.f.). The nourishing solution trayhas a substantially same size as that of the rectangular cultivation plate, and the nourishing solution trayis configured as a rectangular tray so as to fit the cultivation platetherein. In this embodiment, sixteen items are provided on each of the cultivation chambersA in a state in which the cultivation plateis fitted into the nourishing solution trayhaving a size of approximately 30 cm×120 cm (c.f.).
As for the shape of the cultivation chamberA, it is preferable that the cultivation chamberA has a lengthy shape in which a length along a longitudinal direction is more than double a length along a lateral direction (or a transverse direction), because the cultivation chamberA is preferably used in a plant factory having a relatively larger scale of production. In the embodiment, the ratio of the length along the lateral direction to the length along the longitudinal direction is one to five (i.e. lateral direction length:longitudinal direction length=1:5). Please notice that the size of the cultivation chamberA (or the number of cultivation platesarranged in the cultivation chamberA) is not limited to the above-mentioned size of the embodiment.
In addition, according to the embodiment, the nourishing solution trayand the cultivation plateare depicted as being rectangular. Please notice that the shapes are not limited to the example. For example, the shapes may be square. In such a case, one side of the square cultivation plateis arranged along the longitudinal direction of the cultivation chamberA.
In this manner, in a state where the nourishing solution traysare arranged, each of the plurality of cultivation chambersA is in a closed condition or semi-closed condition.
In each of the nourishing solution trays, a discharge portfor discharging a supplied nourishing solution (c.f.) is formed on one end side along the longitudinal direction (or downstream side of a flow of the nourishing solution). In addition, the nourishing solution trayis provided with an inclined surface which is inclined at a predetermined angle (for example, about 1 degree) with respect to the lateral direction of the cultivation chamberA. As a result, a downstream side of a flow of the nourishing solution is lowered. Consequently, the supplied nourishing solution will not stay in the nourishing solution tray, and a flow will be created in one direction at a predetermined flow rate according to a flow rate of the supplied flow. Further, a nourishing solution collect pipe, which will be described later, is arranged below each of the discharge port(c.f.).
Please notice that the nourishing solution traymay not have a size corresponding to one cultivation plate. It is possible to configure the nourishing solution trayto arrange a plurality of cultivation platestherein.
Further, as depicted in, an artificial light sourceis provided above each of the cultivation chambersA, and a light control devicefor dimming the artificial light sourcesis connected to them. In the embodiment, two artificial light sourcesare arranged along the longitudinal direction of the nourishing solution trayand that of the cultivation plate(i.e. along the lateral direction of the cultivation chamberA). It is preferable to use an LED that consumes less power and is able to be configured to be thin, as the artificial light source. Also, it is possible to use a fluorescent lamp as the artificial light source.
As depicted in, an air circulation deviceis provided on one end side along the longitudinal direction of the cultivation roomA adjacently to the cultivation shelf. The air circulation deviceis configured to supply an air which is adjusted to a predetermined condition, to each cultivation chamberA at a predetermined flow rate, to collect the air that has passed through the inside of each cultivation chamberA, and to adjust the air to satisfy a predetermined condition. The air circulation devicerepeats these tasks to perform a circulation feeding.
A configuration of the air circulation devicewill be described with reference to. The air circulation devicemay have a function of adjusting at least a temperature, a humidity, a carbon dioxide concentration, and a flow rate (or an amount of flow) of air. The air circulation deviceof the embodiment is configured to include an air sterilization device; a direct expansion type air conditioner(or an air conditioner of a type of using a refrigerant for directly cooling air) having functions of heating, cooling and dehumidifying; a humidifying devicehaving a humidifying function; a carbon dioxide supply devicefor adjusting a carbon dioxide concentration; a suction pump; and a compression pump.
As a device having a function of adjusting a temperature, it is possible to use an indirect expansion type chiller device (or a chiller device of a type of using a refrigerant for cooling air via water).
Each of the cultivation chambersA and the air circulation deviceare connected via an air collect pipeA and an air supply pipe. The air collect pipeA and the air supply pipeextend along the longitudinally direction of the cultivation chamberA. In the air collect pipeA, a plurality of air collect portsare formed at predetermined intervals. Also, in the air supply pipe, a plurality of air supply portsare formed at predetermined intervals. A constant flow rate valve (not shown) is also provided for these air supply ports.
Further, in each of the cultivation chambers, a temperature sensor, a humidity sensor, and a carbon dioxide concentration sensor (not shown) are provided at predetermined locations for monitoring a temperature, a humidity, and a carbon dioxide concentration of the circulating air.
By using the suction pump, the air is collected from each of the cultivation chambersA via the air collect pipeA. Then. The air is sterilized through the air sterilization deviceand sent to the air conditioner. In the air conditioner, a temperature adjusting and a dehumidifying are carried out in accordance with measurement results obtained from the temperature sensor and the humidity sensor. Then, a humidifying is carried out in the humidifying device. Thereafter, in the carbon dioxide supply device, a carbon dioxide is supplied from a carbon dioxide supply sourcesuch as a carbon dioxide cylinder or the like according to measurement results obtained from the carbon dioxide concentration sensor. Then, the air adjusted to a predetermined condition and a predetermined flow rate is supplied to each of the cultivation chambersA through the air supply pipeby using the compression pump.
The set value of the flow rate of the air may be fixed. Alternatively, the set value may be made variable.
As depicted in, a flow direction of air in the cultivation chamberA is oriented along the lateral direction of the cultivation chamberA. Consequently, compared with a case where a flow direction of air is oriented along the longitudinal direction of the cultivation chamberA, it becomes possible to shorten a time period from supplying of air to collecting of air. Therefore, it becomes possible to suppress a change in the cultivation environment such as a temperature, a humidity, a carbon dioxide concentration or the like occurring on the upstream side and the downstream side of the air flow.
Without being limited by the above-mentioned case, a flow direction of air in the cultivation chamberA may be oriented from the upper side to the lower side of the cultivation chamberA.
In the embodiment, one cultivation deviceA is configured to include one cultivation roomA, and the one cultivation roomA is configured to include a plurality of cultivation chambersA and one air circulation devicein order to provide an air from the single air circulation deviceto a plurality of cultivation chambersA.
However, without being limited by this, one cultivation deviceA may include one cultivation roomA, and the one cultivation roomA may include a plurality of cultivation chambersA and a plurality of air circulation devicescorresponding to each of the cultivation chambersA so that an air may be provided from the corresponding air circulation devicesto each of the cultivation chambersA. In this case, it becomes possible to change a temperature, a humidity, a carbon dioxide concentration, a flow rate (or an amount of flow) and the like of the circulating air for each of the cultivation chambersA.
In addition, one cultivation deviceA may include a plurality of cultivation roomsA, and each of the cultivation roomsA may include a plurality of cultivation chambersA and one air circulation device.
Further, one cultivation deviceA may include a plurality of cultivation roomsA, and each of the cultivation roomsA may include a plurality of cultivation chambersA and a plurality of air circulation devicescorresponding to each of the cultivation chambersA.
As depicted in, the nourishing solution circulation deviceis provided below the cultivation roomA to supply a nourishing solution which is adjusted to a predetermined condition, to each of the nourishing solution traysof the cultivation chambersA at a predetermined flow rate. The nourishing solution circulation deviceis also configured to collect the nourishing solution that has passed through each of the nourishing solution trays, and to adjust the collected nourishing solution to satisfy a predetermined condition. The nourishing solution circulation devicerepeats these tasks to circulate and supply a nourishing solution.
By referring to, a configuration of the nourishing solution circulation devicewill be described. The nourishing solution circulation devicemay have a function of adjusting, at least, a temperature and a nutrient content (i.e. various kinds of ions of the straight fertilizer such as nitrogen, phosphoric acid, potassium, and the like.) of a nourishing solution (or a nutrient fluid). In the embodiment, the nourishing solution circulation deviceis configured to include a nourishing solution sterilization device; a nourishing solution tankconnected to an urban water supply source; a chiller device (not shown) having heating and cooling functions; a nutrient content supply device; an oxygen supply devicefor adjusting a dissolved oxygen concentration by supplying an oxygen; and a nourishing solution pressure pump.
Each of the cultivation chambersA and the nourishing solution circulation deviceare connected to each other via a nourishing solution collect pipeand a nourishing solution supply pipe. The nourishing solution collect pipeis configured to extend along the longitudinal direction of the cultivation chamberA and to collect the nourishing solution discharged from the discharge ports of the nourishing solution trays. The nourishing solution supply pipealso extends along the longitudinal direction of the cultivation chamberA, and a plurality of nourishing solution supply portsare formed at predetermined intervals in the nourishing solution supply pipe. The nourishing solution supply portsmay be opened downward in the nourishing solution supply pipe. However, as depicted in the embodiment, it is preferable to open the nourishing solution supply portsto face a direction which is along a flow direction of the nourishing solution (c.f.). As a result, it becomes possible to increase a flow rate of the nourishing solution as compared with a case where the nourishing solution supply ports are opened downward when a supply amount is equal.
In some embodiments, one cultivation deviceA may include one cultivation roomA, and the one cultivation roomA may include a plurality of cultivation chambersA and one nourishing solution circulation devicein order to provide a nourishing solution from the single nourishing solution circulation deviceto each of the cultivation chambersA.
The set value of the flow rate of the nourishing solution may be fixed. Alternatively, the set value may be made variable.
However, without being limited by this, one cultivation deviceA may include one cultivation roomA, and the one cultivation roomA may include a plurality of cultivation chambersA and a plurality of nourishing solution circulation devicescorresponding to each of the cultivation chambersA so that a nourishing solution may be provided from the corresponding nourishing solution circulation devicesto each of the cultivation chambersA. In this case, it becomes possible to adjust a temperature, a nutrient content, a flow rate, and the like of the nourishing solution for each of the cultivation chambersA.
In addition, one cultivation deviceA may include a plurality of cultivation roomsA, and each of the cultivation roomsA may include a plurality of cultivation chamberA and one nourishing solution circulation device.
Further, one cultivation deviceA may include a plurality of cultivation roomsA, and each of the cultivation roomsA may include a plurality of cultivation chambersA and a plurality of nourishing solution circulation devicecorresponding to each of the cultivation chambersA.
A water temperature sensor (not shown) is attached to the nourishing solution tank, and a single fertilizer sensor SFS for measuring concentrations of various nutrients is attached to the nourishing solution tankin the vicinity of a connection port with the nourishing solution collect pipefor monitoring a water temperature and ion concentrations of various single fertilizers of the nourishing solution which is circulating. The chiller device is able to adjust a temperature of the nourishing solution according to measurement results obtained from the water temperature sensor.
The nutrient content supply deviceis configured to include an ion concentration control unitfor straight fertilizer, a straight fertilizer sensor SFS, and a supply plungerfor ions of straight fertilizer. In the nutrient content supply device, the ion concentration control unitfor straight fertilizer adjusts an ion concentration of straight fertilizer in a nourishing solution by driving the supply plungerfor ions of straight fertilizer according to the measurement results obtained from various straight fertilizer sensors SFS. The ion concentration of straight fertilizer in the nourishing solution may be measured by using a pH sensor and an EC sensor.
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March 31, 2026
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