Materials processing by separately generated process medium constituents

1. An apparatus for generating a medium having a composition and including a plurality of constituents, for treating a substrate, the apparatus comprising: a. a first chamber; b. a substrate support, housed in the first chamber; c. at least one auxiliary chamber; d. a gas distribution system coupled to the first and the at least one auxiliary chamber for conveying gaseous species into the first chamber at a first gas composition and into the at least one auxiliary chamber at a respective gas composition; e. a source of electromagnetic excitation, coupled to each of the first and the at least one auxiliary chamber so as to impart energy to gaseous species contained therein and thereby effect generation of a first constituent, having a composition, in the first chamber at a first pressure and a first temperature and generation of a respective constituent, having a composition, in the at least one auxiliary chamber at a respective pressure and temperature; f. a mass transfer system for conveying the respective constituent generated in the at least one auxiliary chamber into the first chamber for blending with the first constituent so as to produce the medium; and g. means for monitoring the composition of at least one of (i.) the medium and (ii.) at least one of the constituents.

2. The apparatus of claim 1 wherein at least one of the first and respective gas compositions is different from another of the first and respective gas compositions.

3. The apparatus of claim 1 wherein at least one of the first and respective constituents comprises an ion.

4. The apparatus of claim 1 wherein at least one of the first and respective constituents comprises a radical.

5. The apparatus of claim 1 wherein the source of electromagnetic excitation is configured and coupled to each of the first and at least one auxiliary chambers to impart energy to gaseous species in the first chamber at a first power level, to impart energy to gaseous species in the at least one auxiliary chamber at a respective power level and to adjust at least one of the first and respective power levels independently of another of the first and respective power levels, the means for monitoring the composition being coupled to the source of electromagnetic excitation so as to allow adjustment of at least one of the first and respective power levels based on the monitored composition.

6. The apparatus of claim 1 wherein the mass transfer system conveys the respective constituent generated in the at least one auxiliary chamber into the first chamber at a respective mass transfer rate, the means for monitoring the composition being coupled to the mass transfer system so as to allow adjustment of at least one of said at least one respective mass transfer rate based on the monitored composition.

7. The apparatus of claim 1 wherein the medium etches the substrate.

8. The apparatus of claim 1 wherein the medium deposits material onto the substrate.

9. The apparatus of claim 1 further comprising a pressure control system configured to control at least one of the first and respective pressures independently of another of the first and respective pressures, the means for monitoring the composition being coupled to the pressure control system so as to allow adjustment of at least one of the first and respective pressures based on the monitored composition.

10. The apparatus of claim 1 further comprising a temperature control system configured to control at least one of the first and respective temperatures independently of another of the first and respective temperatures, the means for monitoring the composition being coupled to the temperature control system so as to allow adjustment of at least one of the first and respective temperatures based on the monitored composition.

11. The apparatus of claim 6 wherein the at least one auxiliary chamber comprises a plurality of auxiliary chambers, the mass transfer system being configured to regulate at least one of the plurality of respective mass transfer rates independently of another of the plurality of respective mass transfer rates.

12. The apparatus of claim 1 wherein the gas distribution system is coupled to the first and auxiliary chambers so as to control at least one of the first and respective gas compositions independently of another of the first and respective gas compositions, the means for monitoring the composition being coupled to the gas distribution system so as to allow adjustment of at least one of the first and respective gas compositions based on the monitored composition.

13. An apparatus for generating a partially ionized gas for etching a substrate, the partially ionized gas, having a composition and including a first constituent, having a composition, comprising an ion and a second constituent, having a composition, comprising a neutral species, the apparatus comprising: a. a first chamber; b. a substrate support, disposed in the first chamber; c. a second chamber; d. a gas distribution system coupled to the first chamber for conveying gaseous species at a first gas composition into the first chamber and coupled to the second chamber for conveying gaseous species at a second gas composition into the second chamber; e. a source of electromagnetic excitation, coupled to the first and second chambers so as to impart energy to gaseous species contained therein and thereby effect generation of the first constituent in the first chamber at a first pressure and a first temperature and generation of the second constituent in the second chamber at a second pressure and a second temperature; and f. a mass transfer system for conveying the second constituent from the second chamber into the first chamber for blending with the first constituent so as to produce the medium.

14. The apparatus of claim 13 further comprising means for monitoring the composition of at least one of the partially ionized gas and the constituents.

15. The apparatus of claim 14 wherein the second pressure is greater than the first pressure.

16. The apparatus of claim 14 wherein the first pressure is less than 10 milliTorr.

17. The apparatus of claim 14 wherein the second pressure is greater than 50 milliTorr.

18. The apparatus of claim 14 wherein the second pressure is greater than 100 milliTorr.

19. The apparatus of claim 16 wherein the second pressure is greater than 50 milliTorr.

20. The apparatus of claim 14 further comprising a. a third chamber, the gas distribution system being coupled to the third chamber for conveying gaseous species into the third chamber, the source of electromagnetic excitation being coupled to the third chamber so as to impart energy to gaseous species contained therein and thereby effect generation of a third constituent of the medium, the mass transfer system conveying the third constituent from the third chamber into the first chamber for blending with the first and second constituents.

21. The apparatus of claim 14 wherein the mass transfer system conveys the second constituent at a mass transfer rate, the mass transfer system comprising means for regulating the mass transfer rate, the means for monitoring the composition being configured to monitor the composition of the partially ionized medium and coupled to the mass transfer system so as to allow adjustment of the mass transfer rate based on the composition of the partially ionized medium.

22. The apparatus of claim 14 further comprising a pressure control system, coupled to the first and second chambers so as to control each of the first and second pressures independently of one another, the means for monitoring the composition being configured to monitor the composition of the partially ionized medium and coupled to the pressure control system so as to allow adjustment of at least one of the first and second pressures based on the composition of the partially ionized medium.

23. The apparatus of claim 14 further comprising a temperature control system, coupled to the first and second chambers so as to control each of the first and second temperatures independently of one another, the means for monitoring the composition being configured to monitor the composition of the partially ionized medium and coupled to the temperature control system so as to allow adjustment of at least one of the first and second pressures based on the composition of the partially ionized medium.

24. The apparatus of claim 14 wherein the source of electromagnetic excitation is configured to impart energy to gaseous species in the first chamber at a first power level and to impart energy to gaseous species in the second chamber at a second power level and coupled to each of the first and second chambers so as to determine each of the first and second power levels independently of one another, the means for monitoring the composition being configured to monitor the composition of the partially ionized medium and coupled to the source of electromagnetic excitation so as to allow adjustment of at least one of the first and second power levels based on the composition of the partially ionized medium.

25. The apparatus of claim 14 wherein the gas distribution system is coupled to the first and second chambers so as to control each of the first and second gas compositions independently of one another, the means for monitoring the composition being configured to monitor the composition of the partially ionized medium and coupled to the gas distribution system so as to allow adjustment of at least one of the first and second gas compositions based on the composition of the partially ionized medium.

26. An apparatus for generating a reactive medium for treating a substrate, the medium having a composition and including at least a first constituent, the apparatus comprising: a. at least one chamber; b. a gas distribution system for conveying gaseous species into the at least one chamber at a respective gas composition; c. a source of electromagnetic excitation, coupled to the at least one chamber so as to impart energy to gaseous species contained therein and thereby effect generation, in the at least one chamber, of a respective constituent, having a composition, at a respective pressure and a respective temperature; d. a reaction compartment; e. a substrate support housed in the reaction compartment; f. a mass transfer system for conveying the at least one respective constituent into the reaction compartment to produce the reactive medium at a reaction pressure and a reaction temperature; and g. a pressure control system for controlling at least one of the reaction and respective pressures independently of another of the reaction and respective pressures.

27. The apparatus of claim 26 further comprising means for monitoring the composition of at least one of the medium and the constituents.

28. The apparatus of claim 27 wherein at least one of said at least one respective constituent comprises a radical.

29. The apparatus of claim 27 wherein at least one of said at least one respective constituent comprises an ionized species.

30. The apparatus of claim 27 wherein the reaction pressure is lower than at least one of said at least one respective pressure.

31. The apparatus of claim 26 wherein at least one of said at least one respective pressure is greater than 50 milliTorr.

32. The apparatus of claim 27 wherein the mass transfer system conveys the at least one respective constituent at a respective mass transfer rate, the mass transfer system comprising means for regulating the at least one respective mass transfer rate, the means for monitoring the composition being configured to monitor the composition of the medium and coupled to the mass transfer system so as to allow adjustment of at least one of said at least one respective mass transfer rate based on the composition of the medium.

33. The apparatus of claim 27 wherein the means for monitoring composition is coupled to the pressure control system so as to allow adjustment of at least one of the reaction and respective pressures based on the monitored composition.

34. The apparatus of claim 33 wherein the means for monitoring the composition is configured to monitor the composition of the medium, the pressure control system adjusting at least one of the reaction and respective pressures based on the composition of the medium.

35. The apparatus of claim 27 wherein the at least one chamber comprises a plurality of chambers.

36. The apparatus of claim 27 wherein the source of electromagnetic excitation is configured to impart energy to gaseous species in the at least one chamber at a respective power level, the means for monitoring the composition being configured to monitor the composition of the medium and coupled to the source of electromagnetic excitation so as to allow adjustment of at least one of the at least one respective power level based on the composition of the medium.

37. The apparatus of claim 35 wherein the source of electromagnetic excitation is configured to impart energy to gaseous species in each of the plurality of chambers at a respective power level and to adjust at least one of the respective power levels independently of another of the respective power levels, the means for monitoring the composition being configured to monitor the composition of the medium and coupled to the source of electromagnetic excitation so as to allow adjustment of at least one of the plurality of respective power levels based on the composition of the medium.

38. The apparatus of claim 35 wherein the mass transfer system is configured to convey each of the plurality of respective components at a respective mass transfer rate and regulate at least one of the plurality of respective mass transfer rates independently of another of the plurality of respective mass transfer rates, the means for monitoring the composition being configured to monitor the composition of the medium and coupled to the mass transfer system so as to allow adjustment of at least one of the plurality of respective mass transfer rates based on the composition of the medium.

39. The apparatus of claim 27 further comprising a temperature control system configured to control at least one of the reaction and respective temperatures independently of another of the reaction and respective temperatures, the means for monitoring the composition being configured to monitor the composition of the medium and coupled to the temperature control system so as to allow adjustment of at least one of the reaction and respective temperatures based on the composition of the medium.

40. The apparatus of claim 35 wherein at least one of the reaction temperature and the temperature and the one or more respective temperatures.

41. The apparatus of claim 35 wherein the gas distribution system is coupled to each of the plurality of chambers so as to control at least one of the respective gas compositions independently of another of the respective gas compositions, the means for monitoring the composition being configured to monitor the composition of the medium and coupled to the gas distribution system so as to allow adjustment of at least one of the respective gas compositions based on the composition of the medium.

42. A method of treating a substrate with a medium having a composition and comprising a plurality of constituents, the method comprising the steps of: a. providing, at a first power level, electromagnetic excitation to gaseous species at a first location at a first gas composition so as to generate a first constituent having a composition at a first pressure and first temperature; b. providing electromagnetic excitation to gaseous species at least one auxiliary location at a respective gas composition, at a respective power level so as to generate a constituent, having a composition, at the at least one auxiliary location at a respective pressure and temperature, the first and respective power levels, gas compositions pressures, and temperatures being process parameters; c. conveying, at a respective mass transfer rate, the constituent generated at the at least one auxiliary location to the first location for blending with the first constituent so as to create the medium; d. monitoring the composition of at least one of the medium and the first and respective constituents; e. adjusting at least one of (i.) at least one of the process parameters and (ii.) at least one of said at least one respective mass transfer rate based on the monitored composition; and f. exposing the substrate to the medium.

43. A method of treating a substrate with a partially ionized gas having a composition and including a first constituent, having a composition, comprising an ion and a second constituent having a composition, comprising neutral species, the method comprising: a. providing, at a first power level, electromagnetic excitation to gaseous species at a first location at a first gas composition so as to generate the first constituent at a first pressure and first temperature; b. providing, at a second power level, electromagnetic excitation to gaseous species at a second location at a second gas composition so as to generate the second constituent at a second pressure and second temperature, the first and second power levels, gas compositions, pressures, and temperatures being process parameters; c. conveying the second constituent from the second location to the first location at a mass transfer rate for blending with the first constituent so as to create the medium; d. monitoring the composition of at least one of the partially ionized gas and the first and second constituent; e. adjusting at least one of (i.) at least one of the process parameters and (ii.) the mass transfer rate based on the monitored composition; and f. exposing the substrate to the medium.

44. A method of treating a substrate with a medium having a composition and comprising at least one constituent, the method comprising the steps of: a. controlling a reaction pressure at a reaction site and a respective pressure at at least one auxiliary location independently of the pressure at another of the reaction site and the at least one auxiliary location; b. providing, at a respective power level, electromagnetic excitation to gaseous species at a respective gas composition so as to generate a constituent having a composition at the at least one auxiliary location at a respective pressure and temperature; c. conveying, at a respective mass transfer rate, the constituent generated at the at least one auxiliary location to the reaction site for blending with the first constituent so as to create the medium at the reaction pressure and a reaction temperature; and d. exposing the substrate to the medium.

45. The apparatus of claim 5 wherein the monitoring means is configured to monitor the composition of the medium, the source of electromagnetic energy adjusting at least one of the first and respective power levels based on the composition of the medium.

46. The apparatus of claim 6 wherein the monitoring means is configured to monitor the composition of the medium, the mass transfer system adjusting at least one of the at least one respective mass transfer rate based on the composition of the medium.

47. The apparatus of claim 9 wherein the monitoring means is configured to monitor the composition of the medium, the pressure control system adjusting at least one of the first and respective pressures based on the composition of the medium.

48. The apparatus of claim 10 wherein the monitoring means is configured to monitor the composition of the medium, the temperature control system adjusting at least one of the first and respective temperatures based on the composition of the medium.

49. The apparatus of claim 12 wherein the monitoring means is configured to monitor the composition of the medium, the gas distribution system adjusting at least one of the first and respective gas compositions based on the composition of the medium.

50. The method of claim 42 wherein the step of monitoring the composition of at least one of the medium and the first and respective constituents comprises monitoring the composition of the medium.

51. The method of claim 50 wherein the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) the respective mass transfer rate comprises adjusting at least one of the at least one respective mass transfer rate based on the composition of the medium.

52. The method of claim 50 wherein the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) the respective mass transfer rate comprises adjusting at least one of the first and respective power levels based on the composition of the medium.

53. The method of claim 50 wherein the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) the respective mass transfer rate comprises adjusting at least one of the first and respective gas compositions based on the composition of the medium.

54. The method of claim 50 wherein the step of adjusting at least one of(i.) at least one of the process parameters and (ii.) the respective mass transfer rate comprises adjusting at least one of the first and respective temperatures based on the composition of the medium.

55. The method of claim 50 wherein the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) the respective mass transfer rate comprises adjusting at least one of the first and respective pressures based on the composition of the medium.

56. The method of claim 43 wherein the step of monitoring the composition comprises monitoring the composition of the partially ionized gas.

57. The method of claim 56 wherein the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) the mass transfer rate comprises adjusting the mass transfer rate based on the composition of the partially ionized gas.

58. The method of claim 56 wherein the step of adjusting at least one (i.) at least one of the process parameters and (ii.) the mass transfer rate comprises adjusting at least one of the first and second power levels based on the composition of the partially ionized gas.

59. The method of claim 56 wherein the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) the mass transfer rate comprises adjusting at least one of the first and second gas compositions based on the composition of the partially ionized gas.

60. The method of claim 56 wherein the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) the mass transfer rate comprises adjusting at least one of the first and second pressures based on the composition of the partially ionized gas.

61. The method of claim 56 wherein the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) the mass transfer rate comprises adjusting at least one of the first and second temperatures based on the composition of the partially ionized gas.

62. The method of claim 43 wherein the first pressure is less than 10 milliTorr.

63. The method of claim 43 wherein the second pressure is greater than 50 milliTorr.

64. The method of claim 43 wherein the second pressure is greater than 100 milliTorr.

65. The method of claim 62 wherein the second pressure is greater than 50 milliTorr.

66. The method of claim 44 wherein the at least one respective power level, gas composition, pressure and temperature are process parameters and further comprising the steps of: a. monitoring the composition of at least one of the medium and said at least one constituent; and b. adjusting at least one of (i.) at least one of the process parameters and (ii.) at least one of said at least one respective mass transfer rate based on the monitored composition.

67. The method of claim 66 wherein the step of monitoring the composition comprises monitoring the composition of the medium, the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) at least one of said at least one respective mass transfer rate being based on the composition of the medium.

68. The method of claim 67 wherein the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) at least one of said at least one respective mass transfer rate comprises adjusting the at least one respective mass transfer rate.

69. The method of claim 67 wherein the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) at least one of said at least one respective mass transfer rate comprises adjusting at least one of the at least one respective pressure.

70. The method of claim 67 wherein the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) at least one of said at least one respective mass transfer rate comprises adjusting at least one of the at least one respective temperature.

71. The method of claim 67 wherein the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) at least one of said at least one respective mass transfer rate comprises adjusting at least one of the at least one respective power level.

72. The method of claim 67 wherein the step of adjusting at least one of (i.) at least one of the process parameters and (ii.) at least one of said at least one respective mass transfer rate comprises adjusting at least one of the at least one respective gas composition.

73. The method of claim 67 wherein at least one of said at least one respective pressure is greater than 50 milliTorr.