Patentable/Patents/US-6130113
US-6130113

Enhanced lamination process between heatspreader to pressure sensitive adhesive (PSA) interface as a step in the semiconductor assembly process

PublishedOctober 10, 2000
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

Patent Claims
9 claims

Legal claims defining the scope of protection, as filed with the USPTO.

1

1. An enhanced method of applying a pressure sensitive adhesive (PSA) to a heatspreader comprising the steps of: (a) providing a pressure sensitive adhesive (PSA) having a top surface and a releasable liner covering a bottom surface; (b) providing a heatspreader having an upper surface and a lower surface; and (c) attaching the top surface of the PSA to the lower surface of the heatspreader with pressure in an air free environment, the pressure originating from outside of the air free environment.

2

2. The method of claim 1 wherein the air free environment is a vacuum chamber assembly.

3

3. The method of claim 1 further comprising the steps of: (d) removing the releasable liner on the bottom surface of the PSA; and (e) attaching the heatspreader with PSA to an IC die under pressure in an air free environment.

4

4. The method of claim 3 wherein the air free environment is a vacuum chamber assembly.

5

5. An enhanced method of applying a pressure sensitive adhesive (PSA) to a heatspreader comprising the steps of: (a) providing a pressure sensitive adhesive (PSA) having a top surface and a releasable liner covering a bottom surface; (b) providing a heatspreader having an upper surface and a lower surface; (c) providing a vacuum chamber assembly with a pedestal; (d) positioning the bottom surface of the PSA on the pedestal; (e) positioning the lower surface of the heatspreader on the top surface of the PSA; (f) closing the vacuum chamber assembly; (g) drawing a vacuum to remove air inside the vacuum chamber assembly creating an air free environment; (h) applying pressure joining the heatspreader and PSA, the pressure originating from outside of the vacuum chamber assembly; (i) releasing the vacuum in the vacuum chamber assembly; (j) opening the vacuum chamber assembly; and (k) removing the heatspreader with PSA attached from the vacuum chamber assembly.

6

6. The method of claim 5 further including the step of: (l) removing the releasable liner covering the bottom surface of the PSA; and (m) attaching the PSA to an integrated circuit die.

7

7. The method of claim 5 further including the step of: (l) removing the releasable liner covering the bottom surface of the PSA; and (m) attaching the PSA to an integrated circuit die under pressure in a vacuum chamber assembly.

8

8. The method of claim 6 wherein the pressure is applied by way of a lid assembly of the air free environment.

9

9. The method of claim 5 wherein the pressure is applied by way of a lid assembly of the vacuum chamber assembly.

Classification Codes (CPC)

Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.

Patent Metadata

Filing Date

Unknown

Publication Date

October 10, 2000

Want to explore more patents?

Browse 5M+ US patents with plain-English claim translations and AI-generated analysis.

Citation & reuse

Analysis on this page is generated by Patentable — an AI-powered patent intelligence platform. AI-generated summaries, explanations, and analysis may be reused with attribution and a visible link back to the canonical URL below. Patent abstracts and claims are USPTO public domain.

Cite as: Patentable. “Enhanced lamination process between heatspreader to pressure sensitive adhesive (PSA) interface as a step in the semiconductor assembly process” (US-6130113). https://patentable.app/patents/US-6130113

© 2026 Patentable. All rights reserved.

Patentable is a research and drafting-assistant tool, not a law firm, and does not provide legal advice. Documents we generate are drafts for review by a licensed patent attorney.