Continuous cleaning megasonic tank with reduced duty cycle transducers

1. A sonic cleaning tank for cleaning a thin disk comprising: at least two upwardly angled walls; a first transducer array comprising at least one transducer operatively coupled to a first one of the upwardly angled walls, and extending a distance at least equal to the length of a thin disk to be cleaned thereby; and a second transducer array comprising at least one transducer operatively coupled to a second one of the upwardly angled walls, and extending a distance at least equal to the length of a thin disk to be cleaned thereby; a first wall positioned to receive direct energy from the first transducer array and to reflect in a non-interfering manner the energy received from the first transducer array; and a second wall positioned to receive direct energy from the second transducer array and to reflect in a non-interfering manner the energy received from the second transducer array.

2. The apparatus of claim 1 further comprising a thin disk support for contacting the thin disk at two or more points, the thin disk support being positioned so as not to shadow the same region of the thin disk from the energy of both the first transducer array and the second transducer array.

3. The apparatus of claim 2 wherein the thin disk support comprises two side supports positioned along opposite sides of the thin disk so as not to shadow the same region of the thin disk from the energy of both the first transducer array and the second transducer array, and one bottom support positioned along the thin disk's baricenter so as not to shadow the same region of the thin disk from the energy of both the first transducer array and the second transducer array.

4. The apparatus of claim 1 wherein the at least two upwardly angled walls includes only two upwardly angled walls.

5. The apparatus of claim 4 wherein the first upwardly angled wall and the second upwardly angled wall are bottom walls which join forming a 90.degree. angle.

6. The apparatus of claim 5 further comprising a thin disk support comprising two side supports positioned along opposite sides of the thin disk so as not to shadow the same region of the thin disk from the energy of both the first transducer array and the second transducer array, and one bottom support positioned along the thin disk's baricenter so as not to shadow the same region of the thin disk from the energy of both the first transducer array and the second transducer array.

7. The apparatus of claim 1 wherein the first transducer array includes a first and a second transducer; the second transducer array includes a first and a second transducer; and wherein the apparatus further comprises a rotatable thin disk support for rotating the thin disk.

8. The apparatus of claim 1 further comprising a controller for individually energizing the first and the second transducer arrays.

9. The apparatus of claim 8 wherein the controller is programmed to individually energize the first and the second transducer arrays such that only one transducer array is energized at any given time.

10. The apparatus of claim 1 wherein the thin disk support is rotatable so as to rotate a thin disk positioned thereon.

11. A sonic cleaning tank for cleaning a substrate comprising: at least two upwardly angled walls; a first transducer array comprising at least one transducer operatively coupled to a first one of the upwardly angled walls, and extending a distance at least equal to the length of a substrate to be cleaned thereby; a second transducer array comprising at least one transducer operatively coupled to a second one of the upwardly angled walls, and extending a distance at least equal to the length of a substrate to be cleaned thereby; wherein the first upwardly angled wall and the second upwardly angled wall are bottom walls which join forming a 90.degree. angle; and a substrate support comprising two side supports positioned along opposite sides of the substrate so as not to shadow the same region of the substrate from the energy of both the first transducer array and the second transducer array, and one bottom support positioned along the substrate's baricenter so as not to shadow the same region of the substrate from the energy of both the first transducer array and the second transducer array.

12. A sonic cleaning tank for cleaning a substrate comprising: at least two upwardly angled walls; a first transducer array comprising at least one transducer operatively coupled to a first one of the upwardly angled walls, and extending a distance at least equal to the length of a substrate to be cleaned thereby; a second transducer array comprising at least one transducer operatively coupled to a second one of the upwardly angled walls, and extending a distance at least equal to the length of a substrate to be cleaned thereby; a controller for individually energizing the first and the second transducer arrays; wherein the controller is programmed to individually energize the first and the second transducer arrays such that only one transducer array is energized at any given time; and a substrate support adapted to support the substrate and positioned so as not to shadow the same region of the substrate from the energy of both the first transducer array and the second transducer array.

13. The apparatus of claim 12 wherein the substrate support is adapted to contact the substrate at two or more points, the substrate support being positioned so as not to shadow the same region of the substrate from the energy of both the first transducer array and the second transducer array.

14. The apparatus of claim 12 wherein the substrate support comprises two side supports positioned along opposite sides of the substrate so as not to shadow the same region of the substrate from the energy of both the first transducer array and the second transducer array, and one bottom support positioned along the substrate's baricenter so as not to shadow the same region of the substrate from the energy of both the first transducer array and the second transducer array.

15. The apparatus of claim 12 further comprising a first wall positioned to receive direct energy from the first transducer array and to reflect in a non-interfering manner the energy received from the first transducer array, and a second wall positioned to receive direct energy from the second transducer array and to reflect in a non-interfering manner the energy received from the second transducer array.

16. The apparatus of claim 12 wherein the at least two upwardly angled walls includes only two upwardly angled walls.

17. The apparatus of claim 12 wherein the first upwardly angled wall and the second upwardly angled wall are bottom walls which join forming a 90.degree. angle.

18. The apparatus of claim 12 wherein the substrate support comprises two side supports positioned along opposite sides of the substrate so as not to shadow the same region of the substrate from the energy of both the first transducer array and the second transducer array, and one bottom support positioned along the substrate's baricenter so as not to shadow the same region of the substrate from the energy of both the first transducer array and the second transducer array.

19. The apparatus of claim 12 wherein the first transducer array includes a first and a second transducer; the second transducer array includes a first and a second transducer; and wherein the apparatus further comprises a rotatable substrate support for rotating the substrate.

20. The apparatus of claim 12 wherein the lower portions of the two upwardly angled walls are closer together than are the upper portions of the two upwardly angled walls.

21. An apparatus for cleaning a thin disk comprising: a tank having: at least two upwardly angled walls; a first transducer array comprising at least one transducer operatively coupled to a first one of the upwardly angled walls; a second transducer array comprising at least one transducer operatively coupled to a second one of the upwardly angled walls; wherein the tank and the transducer arrays are configured to avoid interfering reflection; and a thin disk support adapted to support the thin disk and positioned along at least one side of the thin disk so as not to shadow the same region of the thin disk from the energy of both the first transducer array and the second transducer array.

22. The apparatus of claim 21 further comprising a controller for individually energizing the first and second transducer arrays.

23. The apparatus of claim 21 wherein the thin disk support comprises two side supports positioned along opposite sides of the thin disk so as not to shadow the same region of the thin disk from the energy of both the first transducer array and the second transducer array.

24. The apparatus of claim 23 further comprising one bottom support positioned along the thin disk's baricenter so as not to shadow the same region of the thin disk from the energy of both the first transducer array and the second transducer array.

25. A sonic cleaning tank for cleaning a substrate comprising: at least two upwardly angled walls; a first transducer array comprising at least one transducer operatively coupled to a first one of the upwardly angled walls, and extending a distance at least equal to the length of a substrate to be cleaned thereby; a second transducer array comprising at least one transducer operatively coupled to a second one of the upwardly angled walls, and extending a distance at least equal to the length of a substrate to be cleaned thereby; a controller for individually energizing the first and the second transducer arrays; wherein the controller is programmed to individually energize the first and the second transducer arrays such that only one transducer array is energized at any given time; and a substrate support for contacting the substrate at two or more points, the substrate support being positioned so as not to shadow the same region of the substrate from the energy of both the first transducer array and the second transducer array.

26. The apparatus of claim 25 wherein the substrate support comprises two side supports positioned along opposite sides of the substrate so as not to shadow the same region of the substrate from the energy of both the first transducer array and the second transducer array, and one bottom support positioned along the substrate's baricenter so as not to shadow the same region of the substrate from the energy of both the first transducer array and the second transducer array.

27. A sonic cleaning tank for cleaning a substrate comprising: at least two upwardly angled walls; a first transducer array comprising at least one transducer operatively coupled to a first one of the upwardly angled walls, and extending a distance at least equal to the length of a substrate to be cleaned thereby; a second transducer array comprising at least one transducer operatively coupled to a second one of the upwardly angled walls, and extending a distance at least equal to the length of a substrate to be cleaned thereby; a controller for individually energizing the first and the second transducer arrays; wherein the controller is programmed to individually energize the first and the second transducer arrays such that only one transducer array is energized at any given time; a first wall positioned to receive direct energy from the first transducer array and to reflect in a non-interfering manner the energy received from the first transducer array; and a second wall positioned to receive direct energy from the second transducer array and to reflect in a non-interfering manner the energy received from the second transducer array.

28. A sonic cleaning tank for cleaning a substrate comprising: at least two upwardly angled walls; a first transducer array comprising at least one transducer operatively coupled to a first one of the upwardly angled walls, and extending a distance at least equal to the length of a substrate to be cleaned thereby; a second transducer array comprising at least one transducer operatively coupled to a second one of the upwardly angled walls, and extending a distance at least equal to the length of a substrate to be cleaned thereby; a controller for individually energizing the first and the second transducer arrays; wherein the controller is programmed to individually energize the first and the second transducer arrays such that only one transducer array is energized at any given time; and a substrate support comprising two side supports positioned along opposite sides of the substrate so as not to shadow the same region of the substrate from the energy of both the first transducer array and the second transducer array, and one bottom support positioned along the substrate's baricenter so as not to shadow the same region of the substrate from the energy of both the first transducer array and the second transducer array.

29. An apparatus for cleaning a thin disk comprising: a tank having: at least two upwardly angled walls; a first transducer array comprising at least one transducer operatively coupled to a first one of the upwardly angled walls; a second transducer array comprising at least one transducer operatively coupled to a second one of the upwardly angled walls; wherein the tank and the transducer arrays are configured to avoid interfering reflection; and a thin disk support comprising two side supports positioned along opposite sides of the thin disk so as not to shadow the same region of the thin disk from the energy of both the first transducer array and the second transducer array.

30. The apparatus of claim 29 further comprising one bottom support positioned along the thin disk's baricenter so as not to shadow the same region of the thin disk from the energy of both the first transducer array and the second transducer array.