A dual stripe magnetoresistive (DSMR) sensor element, and a method for fabricating the dual stripe magnetoresistive (DSMR) sensor element. When fabricating the dual stripe magnetoresistive (DSMR) sensor element while employing the method, there are employed two pair of patterned magnetic biasing layers formed of a single magnetic biasing material. The two pair of patterned magnetic biasing layers bias a pair of patterned magnetoresistive (MR) layers in a pair of opposite canted directions. The method employs multiple thermal annealing methods one of which employs a thermal annealing temperature, a thermal annealing exposure time and an extrinsic magnetic bias field such that a first pair of transversely magnetically biased patterned magnetic biasing layers is not substantially demagnetized when forming a second pair of transversely magnetically biased patterned magnetic biasing layers of anti-parallel transverse magnetic bias direction to the first pair of transversely magnetically biased patterned magnetic biasing layers.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A dual-stripe magnetoresistive sensor element comprising: a substrate; a patterned first magnetoresistive (MR) layer formed over the substrate; a pair of longitudinally separated magnetically biased patterned first magnetic biasing layers formed contacting a pair of opposite ends of the patterned first magnetoresistive (MR) layer; a patterned second magnetoresistive (MR) layer separated vertically from the patterned first magnetoresistive (MR) layer by at least a non-magnetic spacer layer; and a pair of longitudinally separated magnetically biased patterned second magnetic biasing layers formed contacting a pair of opposite ends of the patterned second magnetoresistive (MR) layer, wherein: the pair of magnetically biased patterned second magnetic biasing layers and the pair of magnetically biased patterned first magnetic biasing layers are formed of the same magnetically biasing material; and a second magnetic bias direction within the pair of magnetically biased patterned second magnetic biasing layers makes a second angle with the longitudinal direction and a first magnetic bias direction within the pair of magnetically biased patterned first magnetic biasing layers makes a first angle with the longitudinal direction, where the first angle and the second angle are complementary and are oppositely directed relative to the longitudinal direction.
2. The dual strip magnetoresistive (DSMR) sensor element of claim 1 wherein the dual stripe magnetoresistive (DSMR) sensor element is employed within a magnetic head selected from the group consisting of merged inductive magnetic write dual stripe magnetoresistive (DSMR) read magnetic heads, non-merged inductive magnetic write dual stripe magnetoresistive (DSMR) read magnetoresistive (MR) heads and dual stripe magnetoresistive (DSMR) read only heads.
3. A magnetic data storage enclosure having fabricated therein the magnetic head of claim 2 .
4. The dual stripe magnetoresistive (DSMR) sensor element of claim 1 wherein the magnetic biasing material is an antiferromagnetic magnetic biasing material.
5. The dual stripe magnetoresistive (DSMR) sensor element of claim 1 wherein the patterned first magnetoresistive (MR) layer and the patterned second magnetoresistive (MR) layer have the same resistance.
6. The dual stripe magnetoresistive (DSMR) sensor element of claim 1 wherein the first angle is from about 25 to about 60 degrees.
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March 28, 2001
September 10, 2002
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