Patentable/Patents/US-6492822
US-6492822

Wafer probe station for low-current measurements

PublishedDecember 10, 2002
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

A probe station includes a fully guarded chuck assembly and connector mechanism for increasing sensitivity to low-level currents while reducing settling times. The chuck assembly includes a wafer-supporting first chuck element surrounded by a second chuck element having a lower component, skirting component and upper component each with a surface portion extending opposite the first element for guarding thereof. The connector mechanism is so connected to the second chuck element as to enable, during low-level current measurements, the potential on each component to follow that on the first chuck element as measured relative to an outer shielding enclosure surrounding each element. Leakage current from the first chuck element is thus reduced to virtually zero, hence enabling increased current sensitivity, and the reduced capacitance thus provided by the second chuck element decreases charging periods, hence reducing settling times. With similar operation and effect, where any signal line element of the connector mechanism is arranged exterior of its corresponding guard line element, such as adjacent the chuck assembly or on the probe-holding assembly, a guard enclosure is provided to surround and fully guard such signal line element in interposed relationship between that element and the outer shielding enclosure.

Patent Claims
8 claims

Legal claims defining the scope of protection, as filed with the USPTO.

1

1. A probe station comprising: (a) a chuck assembly for supporting a test device; (b) a probe support for supporting a probe; (c) a positioning mechanism enabling at least one of said probe and said chuck assembly to move relative to the other; (d) said chuck assembly including at least a pair of electrically-conductive chuck assembly elements positioned one above the other in spaced-apart relationship to each other, each having a respective laterally-extending surface facing toward the other said surface with a laterally-extending area therebetween, at least a portion of said area containing one or more air gaps having a total lateral air gap area coextensive with at least a major portion of said laterally-extending area; (e) said probe station including an electrically-conductive enclosure at least partially enclosing said chuck assembly, said chuck assembly elements being separated by respective electrical insulation members from each other and from said conductive enclosure.

2

2. A probe station comprising: (a) a chuck assembly for supporting a test device; (b) a probe support for supporting a probe; (c) a positioning mechanism enabling at least one of said probe and said chuck assembly to move relative to the other; (d) said chuck assembly including at least a pair of electrically-conductive chuck assembly elements positioned one above the other in spaced-apart relationship to each other, each having a respective laterally-extending surface facing toward the other said surface with a laterally-extending area therebetween, at least a portion of said area containing one or more air gaps having a total lateral air gap area coextensive with at least a major portion of said laterally-extending area; (e) said probe station including an electrically-conductive enclosure at least partially enclosing said chuck assembly, said chuck assembly elements being electrically insulated from each other and from said conductive enclosure.

3

3. A probe station comprising: (a) a chuck assembly for supporting a test device; (b) a probe support for supporting a probe; (c) a positioning mechanism enabling at least one of said probe and said chuck assembly to move relative to the other; (d) said chuck assembly including an electrically-conductive chuck assembly element having a laterally-extending surface for supporting said test device; (e) an electrically-conductive component extending laterally in spaced-apart relationship to said surface, at least one of said chuck assembly element and said conductive component being movable laterally with respect to the other, said conductive component defining at least one hole through which said probe can extend transversely with respect to said conductive component so that an electrical connection can be made with said test device by said probe at different lateral relationships between said chuck assembly element and said conductive component, said probe station including an electrically conductive enclosure at least partially enclosing said chuck assembly and said conductive component, said chuck assembly element and said conductive component being separated by respective electrical insulation members from said conductive enclosure.

4

4. The probe station of claim 3 wherein said conductive component has a more extensive lateral area than does said surface.

5

5. A probe station comprising: (a) a chuck assembly for supporting a test device; (b) a probe support for supporting a probe; (c) a positioning mechanism enabling at least one of said probe and said chuck assembly to move relative to the other; (d) said chuck assembly including an electrically-conductive chuck assembly element having a laterally-extending surface for supporting said test device; (e) an electrically-conductive component extending laterally in spaced-apart relationship to said surface, at least one of said chuck assembly element and said conductive component being movable laterally with respect to the other, said conductive component defining at least one hole through which said probe can extend transversely with respect to said conductive component so that an electrical connection can be made with said test device by said probe at different lateral relationships between said chuck assembly element and said conductive component, said probe station including an electrically conductive enclosure at least partially enclosing said chuck assembly and said conductive component, said conductive component being separated by at least one electrical insulation member from said conductive enclosure.

6

6. The probe station of claim 5 wherein said conductive component has a more extensive lateral area than does said surface.

7

7. A probe station comprising: (a) a chuck assembly for supporting a test device; (b) a laterally-extending probe support for supporting a probe; (c) a positioning mechanism enabling at least one of said probe and said chuck assembly to move relative to the other; (d) said chuck assembly including an electrically-conductive chuck assembly element having a laterally-extending surface for supporting said test device; (e) an electrically-conductive component extending laterally in spaced-apart relationship to said surface, at least one of said chuck assembly element and said conductive component being movable laterally with respect to the other, said conductive component and said probe support each defining at least one hole through which said probe can extend transversely with respect to said conductive component and said probe support so that an electrical connection can be made with said test device by said probe at different lateral relationships between said chuck assembly element and said conductive component, said conductive component having a more extensive lateral area than does said laterally-extending surface of said chuck assembly element and being separated by at least one electrical insulation member from said probe support.

8

8. A probe station comprising: (a) a chuck assembly for supporting test device; (b) a probe support for supporting a probe; (c) a positioning mechanism enabling at least one of said probe and chuck assembly to move relative to the other; (d) said chuck assembly including at least upper and lower electrically-conductive chuck assembly elements positioned one above the other in spaced-apart relationship to each other, said lower chuck assembly element including an upwardly-extending electrically-conductive member in laterally spaced-apart relationship to said upper chuck assembly element; (e) said probe station including an electrically-conductive environment control enclosure mounted thereon having a sidewall portion in laterally spaced-apart relationship to said upper chuck assembly element with said upwardly-extending electrically-conductive member located therebetween, and defining a controlled-environment region in communication with an upper surface area on said upper chuck assembly element, said chuck assembly elements being separated by respective electrical insulation members from each other and from said conductive enclosure; and (f) said chuck assembly being movable laterally relative to said sidewall portion of said enclosure while a constant lateral spacing is maintained between said upwardly-extending electrically-conductive member and said upper chuck assembly element.

Classification Codes (CPC)

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Patent Metadata

Filing Date

October 30, 2001

Publication Date

December 10, 2002

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Cite as: Patentable. “Wafer probe station for low-current measurements” (US-6492822). https://patentable.app/patents/US-6492822

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Wafer probe station for low-current measurements — Richard H. Warner | Patentable