Formation method for semiconductor layer

1. A method for forming a semiconductor layer, the method comprising the steps of: forming a Group III-V compound semiconductor layer, to which a p-type dopant has been introduced, over a substrate; and annealing the compound semiconductor layer, wherein the annealing step includes the step of eliminating atoms, deactivating the p-type dopant, from the compound semiconductor layer by relaxing an internal stress of the compound semiconductor layer in the stage of heating the compound semiconductor layer.

2. The method of claim 1 , wherein the stage of heating the compound semiconductor layer includes the step of relaxing the internal stress of the compound semiconductor layer by adjusting an ambient pressure on the substrate.

3. The method of claim 2 , wherein the stage of heating the compound semiconductor layer includes the step of setting the ambient pressure higher than the atmospheric pressure.

4. The method of claim 2 , wherein the stage of heating the compound semiconductor layer includes the step of adjusting the ambient pressure when the substrate has a temperature of 500 C. or lower.

5. The method of claim 1 , wherein the compound semiconductor layer contains nitrogen as a Group III element.

6. The method of claim 5 , wherein the compound semiconductor layer is a cladding, contact, or light guide layer for a light-emitting element.