Disclosed is a manufacturing method of a circuit of a printed circuit board using a dry film resist in forming a circuit pattern on a copper overlaid laminate as a normal printed circuit board, in which a modification of the manufacturing process can enhance the resolution and fine weldability of the resist to realize a fine structure of the circuit pattern. The method includes: laminating the dry film resist on the top surface of the printed circuit board; exposing the dry film resist to ultraviolet (UV) radiations using a photomask in which a desired circuit pattern is formed; annealing the resulting material of the previous step with infrared (IR) radiations; and removing unexposed areas of the resist by development.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A manufacturing method of a printed circuit board using a dry film resist, comprising the steps of sequentially: laminating a dry film resist on a printed circuit board; exposing said dry film resist to UV radiation in the presence of a photo mask; annealing said dry film resist subsequent to said UV radiation curing step; and developing said dry film resist and removing unexposed areas of said resist, wherein said resist has a thickness defined by the relationship 5 m t 100 m wherein t represents the thickness of a resist layer between base and cover films of the dry film resist, provided that 20 m t 30 m is excluded.
2. The manufacturing method as claimed in claim 1 , wherein the annealing step is performed with a heated roller or a hot air oven.
3. The manufacturing method as claimed in claim 2 , wherein the annealing step using a heated roller is performed under conditions satisfying at least one of using 1 to 5 heating rollers, a temperature of the heating roller 30 to 160 C., a driving rate of the heating roller 0.2 to 5.0 m/min or a pressure of the heating roller 10 to 90 psi.
4. The manufacturing method as claimed in claim 2 , wherein the annealing step using a hot air oven is performed under conditions satisfying at least one of a temperature 30 to 200 C. or an annealing time 5 to 600 seconds.
5. The manufacturing method as claimed in claim 1 , wherein the annealing step is performed in an infrared drying zone.
6. The manufacturing method as claimed in claim 5 , wherein the annealing step using an infrared drying zone is performed under conditions satisfying at least one of a length of the infrared drying zone 30 to 300 cm, a temperature 30 to 150 C. or a detention time of the infrared drying zone 5 to 600 seconds.
7. A method for fabricating a printed circuit board using a dry film photoresist, comprising the steps of laminating a dry film resist on a printed circuit board; exposing said dry film resist to UV radiation in the presence of a photo mask; annealing said dry film resist subsequent to said UV radiation curing step by means of infrared irradiation; and developing said dry film resist and removing unexposed areas of said resist, said infrared annealing process being performed at 30 to 150 C. for 5 to 600 seconds in an infrared drying zone having a length of 30 to 300 cm.
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December 18, 2001
May 25, 2004
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