The present invention discloses a method of manufacturing an array substrate, comprising: forming an electrode line on a substrate using a wet etching technique; and forming an organic insulating layer on an exposed surface of the substrate while covering the electrode line, wherein the electrode line has a side portion having an overhang or a taper angle of more than 45° C. Due to the method, the ashing process using a dry etchant gas cannot be needed anymore.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A method of manufacturing an array substrate, comprising: forming an electrode line on a substrate using a wet etching technique; and forming an organic insulating layer on an exposed surface of the substrate while covering the electrode line, wherein the electrode line has a side portion having an overhang or a taper angle of more than 45 from a top surface of the electrode line.
2. The method of claim 1 , wherein the organic insulating layer is made of one of benzocyclobutene, an olefin-based insulating material, an acrylic-based insulating material, and a silicon-based insulating material.
3. The method of claim 1 , wherein the electrode line has first and second metal layers of a dual-layered structure, and a side portion of the first metal layer is more etched than a side portion of the second metal layer.
4. The method of claim 3 , wherein the first metal layer is made of one of aluminum, an aluminum alloy, AlNd, copper or a copper alloy.
5. The method of claim 3 , wherein the second metal layer is made of one of Cr, Cr-alloy, Mo, Mo-alloy, Ta, Ta-alloy, W, or W-alloy.
6. The method of claim 1 , wherein the electrode line has first, second and third metal layers of a three-layered structure, and a side portion of the second metal layer is less etched than that of the first and third metal layers.
7. An array substrate for a liquid crystal display device, comprising: an electrode line formed on a substrate; and an organic insulating layer formed on an exposed surface of the substrate while covering the electrode line, wherein the electrode line has an overhang or a taper angle of a side portion of the electrode line is more than 45 from a top surface of the electrode line.
8. The array substrate of claim 7 , wherein the organic insulating layer is made of one of benzocyclobutene, an olefin-based insulating material, an acrylic-based insulating material, and a silicon-based insulating material.
9. The array substrate of claim 7 , wherein the electrode line has first and second metal layers of a dual-layered structure, and a side portion of the first metal layer is more etched than that of the second metal layer.
10. The array substrate of claim 9 , wherein the first metal layer is made of one of aluminum, an aluminum alloy, AlNd, copper or a copper alloy.
11. The array substrate of claim 9 , wherein the second metal layer is made of one of Cr, Cr-alloy, Mo, Mo-alloy, Ta, Ta-alloy, W, or W-alloy.
12. The array substrate of claim 7 , wherein the electrode line has first, second and third metal layers of a three-layered structure, and a side portion of the second metal layer protrudes beyond side portions of the first and third metal layers.
Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.
December 22, 2000
October 19, 2004
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