Fabrication method for sample to be analyzed

The semiconductor substrate is removed from a wafer or a chip wherein a defect has occurred and, thereby, the surface, which faces the substrate, that contacts the semiconductor substrate in an element formation portion is exposed. A cross section of the element formation portion is exposed through the irradiation of a focused ion beam. Furthermore, a microprober is adhered to the sample and, then, the sample including a foreign substance that is considered to be a cause of defects is detached from the element formation portion. The extracted sample is moved onto a supporting base for analysis and the sample is secured to the supporting base for analysis by forming a tungsten film. Thereby, detailed information can be gained concerning a defective portion that is located, in particular, in the vicinity of the surface of the semiconductor substrate from among defective portions that have occurred in the semiconductor device.