An apparatus for detecting the presence of metal material in a semiconductor wafer. The apparatus comprises: (i) a current-carrying coil for generating a first magnetic field, wherein the first magnetic field is capable of causing the metal material in the semiconductor wafer to generate an opposing magnetic field; and (ii) a detection circuit for detecting the opposing magnetic field generated by the metal material when the semiconductor wafer is in proximity to the current-carrying coil.
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January 23, 2003
January 4, 2005
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