A spin valve transistor, magnetic reproducing head including a spin valve transistor and a magnetic information storage system having the spin valve transistor. The spin valve transistor has a collector, a base formed on the collector, a tunnel barrier layer formed on the base and an emitter formed on the tunnel barrier layer. In one embodiment, the collector may have a first semiconductor layer of first composition and a second semiconductor layer of a different composition epitaxially grown. The base of the first spin valve transistor may be formed on the second semiconductor layer and have a magnetization pinned layer having a magnetization substantially fixed in an applied magnetic field, a nonmagnetic layer and a magnetization free layer having a magnetization free to rotate under the applied magnetic field. The emitter of a spin valve transistor of a second embodiment may include a semiconductor layer containing an oxide of transitional metal and contacting the tunnel barrier layer.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A spin valve transistor, comprising: a collector having a first semiconductor layer of first composition and a second semiconductor layer formed on the first semiconductor layer, the second semiconductor layer comprising an epitaxially growth layer of a second composition different from the first composition; a base formed on the second semiconductor layer and having a magnetization pinned layer, a nonmagnetic layer and a magnetization free layer, the magnetization pinned layer having a magnetization substantially fixed in an applied magnetic field, and the magnetization free layer having a magnetization free to rotate under the applied magnetic field; a tunnel barrier layer of dielectric material formed on the base; and an emitter formed on the tunnel barrier layer.
2. A spin valve transistor of claim 1 , wherein the first semiconductor layer has a first electron affinity and the second semiconductor layer has a second electron affinity, and the second electron affinity is smaller than the first electron affinity.
3. A spin valve transistor of claim 1 , wherein the first semiconductor layer has a first energy band gap and the second semiconductor layer has a second energy band gap, and the second energy band gap is larger than the first energy band gap.
4. A spin valve transistor of claim 1 , wherein the first semiconductor layer contains silicon, germanium, or gallium arsenide.
5. A spin valve transistor of claim 1 , wherein the tunnel barrier layer contains a dielectric material.
6. A spin valve transistor, comprising: a collector; a base formed on the collector and having a magnetization pinned layer, a nonmagnetic layer and a magnetization free layer, the magnetization pinned layer having a magnetization substantially pinned in an applied magnetic field, and the magnetization free layer having a magnetization free to rotate in the applied magnetic field; a tunnel barrier layer of dielectric material formed on the base; and an emitter formed on the tunnel barrier layer and comprising a semiconductor layer, the semiconductor layer containing an oxide of transitional metal and contacting the tunnel barrier layer.
7. A spin valve transistor of claim 6 , wherein the oxide of transitional metal is a semiconductor material selected from the group consisting of a titanium oxide, a manganese oxide and an iron oxide.
8. A magnetic reproducing head, comprising: a spin valve transistor comprising, a collector having a first semiconductor layer of first composition and a second semiconductor layer formed on the first semiconductor layer, the second semiconductor layer comprising an epitaxially grown layer of a second composition different from the first composition, a base formed on the second semiconductor layer and having a magnetization pinned layer, a nonmagnetic layer and a magnetization free layer, the magnetization pinned layer having a magnetization substantially fixed in an applied magnetic field, and the magnetization free layer having a magnetization free to rotate under the applied magnetic field, a tunnel barrier layer of dielectric material formed on the base, and an emitter formed on the tunnel barrier layer.
9. A magnetic reproducing head of claim 8 , comprising an electrical field effect transistor, wherein the collector is electrically coupled to the electrical field effect transistor, and the spin valve transistor and the electrical field effect transistor are formed on the same substrate.
10. A magnetic reproducing head of claim 8 , further comprising a magnetic flux guide magnetically coupled to the magnetization free layer.
11. A spin valve transistor of claim 8 , wherein the first semiconductor layer has a first electron affinity and the second semiconductor layer has a second electron affinity, and the second electron affinity is smaller than the first electron affinity.
12. A spin valve transistor of claim 8 , wherein the first semiconductor layer has a first energy band gap and the second semiconductor layer has a second energy band gap, and the second energy band gap is larger than the first energy band gap.
13. A spin valve transistor of claim 8 , wherein the first semiconductor layer contains silicon, germanium, or gallium arsenide.
14. A spin valve transistor of claim 8 , wherein the tunnel barrier layer contains a dielectric material.
15. A magnetic reproducing head, comprising: a spin valve transistor comprising, a collector, a base formed on the collector and having a magnetization pinned layer, a nonmagnetic layer and a magnetization free layer, the magnetization pinned layer having a magnetization substantially pinned in an applied magnetic field, and the magnetization free layer having a magnetization free to rotate in the applied magnetic field, a tunnel barrier layer of dielectric material formed on the base, and an emitter formed on the tunnel barrier layer and comprising a semiconductor layer, the semiconductor layer containing an oxide of transitional metal and contacting the tunnel barrier layer.
16. A magnetic reproducing head of claim 15 , comprising an electrical field effect transistor, wherein the collector is electrically coupled to the electrical field effect transistor, and the spin valve transistor and the electrical field effect transistor are formed on the same substrate.
17. A magnetic reproducing head of claim 15 , further comprising a magnetic flux guide magnetically coupled to the magnetization free layer.
18. A spin valve transistor of claim 15 , wherein the oxide of transitional metal comprises a semiconductor material selected from the group consisting of a titanium oxide, a manganese oxide and an iron oxide.
19. A magnetic information storage system, comprising: a spin valve transistor, comprising, a collector having a first semiconductor layer of first composition and a second semiconductor layer formed on the first semiconductor layer, the second semiconductor layer comprising an epitaxially growth layer of a second composition different from the first composition, a base formed on the second semiconductor layer and having a magnetization pinned layer, a nonmagnetic layer and a magnetization free layer, the magnetization pinned layer having a magnetization substantially fixed in an applied magnetic field, and the magnetization free layer having a magnetization free to rotate under the applied magnetic field, a tunnel barrier layer of dielectric material formed on the base, and an emitter formed on the tunnel barrier layer.
20. A magnetic information storage system, comprising; a spin valve transistor, comprising, a collector, a base formed on the collector and having a magnetization pinned layer, a nonmagnetic layer and a magnetization free layer, the magnetization pinned layer having a magnetization substantially pinned in an applied magnetic field, and the magnetization free layer having a magnetization free to rotate in the applied magnetic field, a tunnel barrier layer of dielectric material formed on the base, and an emitter formed on the tunnel barrier layer and comprising a semiconductor layer, the semiconductor layer containing an oxide of transitional metal and contacting the tunnel barrier layer.
Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.
March 28, 2003
March 1, 2005
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