A plasma processing apparatus, comprising: at least, a plasma processing chamber for processing therein an object to be processed; antenna means for guiding microwaves into the plasma processing chamber; and a dielectric member disposed between the antenna means and the plasma processing chamber; wherein a surface of the dielectric member facing the inside of the plasma processing chamber has a projecting shape.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A plasma processing apparatus, comprising: a plasma processing chamber for processing therein an object to be processed; antenna means for guiding microwaves into the plasma processing chamber; and a dielectric member disposed between the antenna means and the plasma processing chamber; wherein a surface of the dielectric member facing the inside of the plasma processing chamber has a projection provided in a circumferential direction of the dielectric member, and wherein the projection has a corner-shaped or edge shaped portion having a curved surface.
2. A plasma processing apparatus according to claim 1 , wherein the antenna means comprises a plane antenna member having plural slots.
3. A plasma processing apparatus according to claim 1 , wherein the dielectric member also has a projection provided in a radial direction thereof.
4. A plasma processing apparatus, comprising: a plasma processing chamber for processing therein an object to be processed; antenna means for guiding microwaves into the plasma processing chamber; and a dielectric member disposed between the antenna means and the plasma processing chamber; wherein a surface of the dielectric member facing an inside of the plasma processing chamber has a projection provided along longitudinal and transverse directions of the dielectric member.
5. A plasma processing apparatus according to claim 4 , wherein the antenna means comprises a plane antenna member having plural slots.
6. A plasma processing apparatus according to claim 4 , wherein the projection has a corner-shaped or edge-shaped portion having a curved surface.
7. A plasma processing apparatus according to claim 4 , wherein the dielectric member has a plurality of projections facing the inside of the plasma processing chamber, the projections are provided so that they constitute a crossing-type arrangement, and a crossing portion of the projections has a curved surface.
8. A plasma processing apparatus according to claim 4 , wherein the dielectric member has a plurality of projections facing the inside of the plasma processing chamber, and crossing of the projections is avoided.
Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.
December 17, 2003
October 11, 2005
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