Patentable/Patents/US-7136402
US-7136402

Laser device and exposure method

PublishedNovember 14, 2006
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

A laser device which can be used as a light source for an exposure device, can be downsized, and is easy to maintain. A laser beam (LB6) emitted from a DFB (Distributed feedback) semiconductor laser, for example, and amplified by an optical fiber amplifier is passed through non-linear optical crystals (502, 503, 504) to be sequentially doubled in frequency to thereby generate an ultraviolet-region laser beam (LB5) consisting of an octuple wave. A GdYCOB, that is, GdxY1−xCa4O(BO3)3 crystal (0≦×≦1) is used for the non-linear optical crystal (503) for a double wave-to-quadruple wave conversion, and a KAB, that is, K2Al2B4O7 crystal for the non-linear optical crystal (504) for a quadruple wave-to-octuple wave conversion. The non-linear optical crystals (502-504) are all fine-tuned in phase match angle by temperature controllers (521-523) respectively.

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Patent Metadata

Filing Date

September 8, 2000

Publication Date

November 14, 2006

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