Patentable/Patents/US-7344603
US-7344603

Solvent for treating polysilazane and method of treating polysilazane with the solvent

PublishedMarch 18, 2008
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

Polysilazane is treated with a single or mixed solvent comprising one or more members selected from the group consisting of xylene, anisole, decalin, cyclohexane, cyclohexene, methylcyclohexane, ethylcyclohexane, limonene, hexane, octane, nonane, decane, a C8-C11 alkane mixture, a C8-C11 aromatic hydrocarbon mixture, an aliphatic/alicyclic hydrocarbon mixture containing 5 to 25% by weight of C8 or more aromatic hydrocarbons, and dibutyl ether, wherein the number of 0.5 micron or more fine particles contained in 1 ml of the solvent is 50 or less. As the treatment of polysilazane, there are illustrated, for example, edge-rinsing and back rinsing of a polysilazane film formed by spin coating polysilazane on a semiconductor substrate. The water content of the solvent is preferably 100 ppm or less.

Patent Claims
2 claims

Legal claims defining the scope of protection, as filed with the USPTO.

1

1. A method of removing, dissolving, rinsing or peeling polysilazane coated on an edge or a back of a substrate, which comprises contacting a composition comprising a solvent, which is a single or mixed solvent comprising one or more members selected from the group consisting of xylene, anisole, decalin, cyclohexane, cyclohexene, methylcyclohexane, ethylcyclohexane, limonene, hexane, octane, nonane, decane, a C8-C11 alkane mixture, a C8-C11 aromatic hydrocarbon mixture, an aliphatic/alicyclic hydrocarbon mixture containing 5 to 25 wt. % C8 or more aromatic hydrocarbons, and dibutyl ether, wherein the number of 0.5 micron or more fine particles contained in 1 ml of the solvent is 50 or less, and wherein the solvent has a water content of 100 ppm or less and said composition further comprises mineral spirit as a diluent solvent, with polysilazane and removing, dissolving, rinsing or peeling the polysilazane coated on the edge or the back of the substrate by jetting the composition onto the polysilazane.

2

2. The method of removing, dissolving, rinsing or peeling polysilazane coated on an edge or a back of a substrate according to claim 1 , wherein the polysilazane is coated on the substrate by applying a polysilazane solution onto the substrate.

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Patent Metadata

Filing Date

December 19, 2002

Publication Date

March 18, 2008

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Cite as: Patentable. “Solvent for treating polysilazane and method of treating polysilazane with the solvent” (US-7344603). https://patentable.app/patents/US-7344603

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