An apparatus which exposes a substrate to radiant energy includes a unit which holds a first mask having a pattern which includes a pattern of a target mark, a unit which projects a pattern of radiant energy to the substrate through the first mask, a unit which holds a second mask having an auxiliary pattern for identifying the target mark to be formed on the substrate, and a unit which controls the projecting unit so as to project a pattern of radiant energy to the substrate through the second mask.
Legal claims defining the scope of protection, as filed with the USPTO.
1. An apparatus which transfers a device pattern onto a substrate, said apparatus comprising: a stage which holds a mask having the device pattern and a target mark pattern; a reference plate placed on the stage and having an auxiliary pattern for identifying the target mark pattern; a projection unit which projects the device pattern as well as the target mark pattern; and a control unit which controls the stage such that the auxiliary pattern is transferred onto the substrate for identifying the target mark pattern.
Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.
June 28, 2005
April 8, 2008
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