An asymmetrically programmed memory material (such as a solid electrolyte material) is described for use as a rectifying element for driving symmetric or substantially symmetric resistive memory elements in a crosspoint memory architecture. A solid electrolyte element (SE) has very high resistance in the OFF state and very low resistance in the ON state (because it is a metallic filament in the ON state). These attributes make it a near ideal diode. During the passage of current (during program/read/erase) of the memory element, the solid electrolyte material also programs into the low resistance state. The final state of the solid electrolyte material is reverted to a high resistance state while making sure that the final state of the memory material is the one desired.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A method for use with a crosspoint array, said crosspoint array comprising a plurality of bitlines and wordlines and a plurality of crossbar elements, each crossbar element disposed between a bitline and a wordline and each crossbar element comprising at least a solid electrolyte material used as a rectifier in series with a symmetric or substantially symmetric resistive memory, said method comprising the steps of: applying a first set of voltages to at least one of said crossbar elements, said first set of voltages transitioning said solid electrolyte in said crossbar elements from an OFF state to an ON state; applying a second set of voltages to at least one of said crossbar elements, said second set of voltages reading or programming said symmetric resistive memory, applying a third set of voltages to at least one of said crossbar elements, said third set of voltages transitioning solid electrolyte from an ON state to a OFF state; said solid electrolyte material, in said ON state has a first resistance, R ON , and in an OFF state has a second resistance, R OFF , with R OFF /R ON >10 4 , and said solid electrolyte material, in an ON state, supplies an ultrahigh current density that is greater than 10 7 A/cm 2 to said symmetric or substantially symmetric resistive memory, said solid electrolyte material includes at least one of the following: germanium sulfide (Ge x S 1−x ), germanium selenide (Ge x Se 1−x ), germanium telluride (Ge x Te 1−x ), silicon sulfide (Si x Si 1−x ), silicon selenide (Si x Se 1−x ), silicon telluride (Si x Te 1−x ), arsenic sulfide (As x S 1−x ), arsenic selenide (As x Se 1−x ), arsenic telluride (As x Te 1−x ), lead sulfide (Pb x S 1−x ), lead selenide (Pb x Se 1−x ), lead telluride (Pb x Te 1−x ), cadmium sulfide (Cd x S 1−x ), cadmium selenide (Cd x Se 1−x ), cadmium telluride (Cd x Te 1−x ), zinc sulfide (Zn x S 1−x ), zinc selenide (Zn x Se 1−x ), zinc telluride (Zn x Te 1−x ), silver sulfide (Ag x S), silver selenide (Ag x Se), copper sulfide (Cu x S), copper selenide (Cu x Se), tungsten oxide (WO x ), copper oxide (Cu x O), silver (Ag), copper (Cu), lithium (Li), sodium (Na), and zinc (Zn), and said symmetric or substantially symmetric resistive memory is at least one of the following: phase change memory (PCM) magnetoresistive random access memory (MRAM), ferroelectric random access memory (FeRAM), organic resistive memory, complex metal oxide, perovskite memory, and oxide resistive memory.
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February 27, 2007
June 3, 2008
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