Patentable/Patents/US-7402913
US-7402913

High density nanostructured interconnection

PublishedJuly 22, 2008
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

A method and apparatus for forming an electrically and/or thermally conducting interconnection is disclosed wherein a first surface and a second surface are contacted with each other via a plurality of nanostructures disposed on at least one of the surfaces. In one embodiment, a first plurality of areas of nanostructures is disposed on a component in an electronics package such as, illustratively, a microprocessor. The first plurality of areas is then brought into contact with a corresponding second plurality of areas of nanostructures on a substrate, thus creating a strong friction bond. In another illustrative embodiment, a plurality of nanostructures is disposed on a component, such as a microprocessor, which is then brought into contact with a substrate. Intermolecular forces result in an attraction between the molecules of the nanostructures and the molecules of the substrate, thus creating a bond between the nanostructures and the substrate.

Patent Claims
5 claims

Legal claims defining the scope of protection, as filed with the USPTO.

1

1. An interconnection comprising: a first surface; a second surface; a first plurality of conductive nanostructures disposed on said first surface; a second plurality of conductive nanostructures disposed on said second surface, wherein said first plurality of nanostructures and said second plurality of nanostructures are configured to interleave with one another and adapted to transfer thermal or electrical energy from said first plurality of nanostructures to said second plurality of nanostructures, and further wherein said first plurality of nanostructures and said second plurality of nanostructures adhere to one another using attractive forces with sufficient force to hold the first and second surfaces in contact with one another.

2

2. The interconnect as recited in claim 1 wherein the attractive forces are intermolecular or capillary attractive forces.

3

3. An interconnection for use with electrical components comprising: a first surface; a second surface; a first plurality of nanostructures disposed on one side of an intermediate layer and a second plurality of nanostructure disposed on an opposing side of said intermediate layer, said intermediate layer configured to be positioned between said first surface and said second surface such that said first plurality of nanostructures adhere to said first surface and said second plurality of nanostructures adhere to said second surface, wherein said first plurality of nanostructures adhere to said first surface using attractive forces and said second plurality of nanostructures adhere to said second surface using attractive forces.

4

4. The interconnect as recited in claim 3 wherein said first plurality of nanostructures and said second plurality of nanostructures form a conductive connection between said first surface and said second surface.

5

5. The interconnect as recited in claim 3 wherein the attractive forces are intermolecular or capillary attractive forces.

Classification Codes (CPC)

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Patent Metadata

Filing Date

September 10, 2007

Publication Date

July 22, 2008

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Cite as: Patentable. “High density nanostructured interconnection” (US-7402913). https://patentable.app/patents/US-7402913

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