Patentable/Patents/US-7407605
US-7407605

Manufacturable CoWP metal cap process for copper interconnects

PublishedAugust 5, 2008
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

An aqueous seeding solution of palladium acetate, acetic acid and chloride.

Patent Claims
3 claims

Legal claims defining the scope of protection, as filed with the USPTO.

1

1. A seeding solution for depositing a palladium seed on copper comprising an aqueous solution of palladium acetate, acetic acid, and hydrochloric acid.

2

2. The seeding solution of claim 1 wherein the aqueous solution of palladium acetate, acetic acid, and chloride comprises 0.01 g/l palladium acetate, 0.25 to 5 volume percent acetic acid and 3 to 10 ppm hydrochloric acid.

3

3. The seeding solution of claim 1 wherein the aqueous solution of palladium acetate, acetic acid, and chloride comprises 0.01 g/l palladium acetate, 0.25 to 1 volume percent acetic acid and 3 to 10 ppm hydrochloric acid.

Classification Codes (CPC)

Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.

Patent Metadata

Filing Date

May 22, 2007

Publication Date

August 5, 2008

Want to explore more patents?

Browse 5M+ US patents with plain-English claim translations and AI-generated analysis.

Citation & reuse

Analysis on this page is generated by Patentable — an AI-powered patent intelligence platform. AI-generated summaries, explanations, and analysis may be reused with attribution and a visible link back to the canonical URL below. Patent abstracts and claims are USPTO public domain.

Cite as: Patentable. “Manufacturable CoWP metal cap process for copper interconnects” (US-7407605). https://patentable.app/patents/US-7407605

© 2026 Patentable. All rights reserved.

Patentable is a research and drafting-assistant tool, not a law firm, and does not provide legal advice. Documents we generate are drafts for review by a licensed patent attorney.