A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a shockwave in the substrate.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A lithographic apparatus comprising: an illumination system constructed and arranged to condition a radiation beam; a support constructed and arranged to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed and arranged to hold a substrate; and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate, the substrate table comprising a plurality of projections constructed and arranged to to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a shockwave in the substrate.
2. A lithographic apparatus according to claim 1 , wherein the actuator is constructed and arranged to exert a pre-determined push on the substrate.
3. A lithographic apparatus according to claim 1 , wherein the actuator comprises a part that is constructed and arranged to move periodically or quasi periodically.
4. A lithographic apparatus according to claim 1 , wherein the actuator is constructed and arranged to contact the substrate directly.
5. A lithographic apparatus according to claim 1 , wherein the actuator is constructed and arranged to exert a substantially upwardly oriented force to the substrate.
6. A lithographic apparatus according to claim 1 , wherein the actuator comprises a contact area constructed and arranged to exert an impinging force in the substrate, and wherein the contact area is covered with a compliant material.
7. A lithographic apparatus according to claim 6 , wherein the contact area of the actuator has a shape designed for reproducing a pre-determined push.
8. A lithographic apparatus according to claim 1 , wherein the actuator is driven by a mechanical, electrical, magnetic, electrostatic, or piezo force and/or by gas pressure.
9. A lithographic apparatus according to claim 1 , wherein the actuator is integrated with a substrate lifting actuator.
10. A lithographic apparatus according to claim 1 , wherein the projections comprise burls.
11. A lithographic apparatus according to claim 1 , wherein the shockwave excited by the actuator is configured to break a bonding force between the substrate and the substrate table.
12. A lithographic apparatus according to claim 11 , wherein the bonding force is residual force that bonds the substrate to the substrate table after ceasing to exert a clamping force that is configured to clamp the substrate to the substrate table during substrate exposure.
13. A substrate table for supporting a substrate in a lithographic apparatus, the substrate table comprising: a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate; and an actuator constructed and arranged to excite a shockwave in the substrate.
14. A substrate table according to claim 13 , wherein the actuator is constructed and arranged to exert a pre-determined push on the substrate.
15. A substrate table according to claim 13 , wherein the actuator comprises a part that is constructed and arranged to move periodically or quasi periodically.
16. A substrate table according to claim 13 , wherein the actuator is constructed and arranged to contact the substrate directly.
17. A substrate table according to claim 13 , wherein the actuator is constructed and arranged to exert a substantially upwardly oriented force to the substrate.
18. A substrate table according to claim 13 , wherein the actuator comprises a contact area constructed and arranged to exert an impinging force on the substrate, and wherein the contact area is covered with a compliant material.
19. A substrate table according to claim 18 , wherein the contact area of the actuator has a shape designed for reproducing a pre-determined push.
20. A substrate table according to claim 13 , wherein the actuator is driven by a mechanical, electrical, magnetic, electrostatic, or piezo force and/or by gas pressure.
21. A substrate table according to claim 13 , wherein the actuator is integrated with a substrate lifting actuator.
22. A substrate table according to claim 13 , wherein the projections comprise burls.
Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.
December 22, 2006
March 24, 2009
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