An MOS type solid-state image pickup device including pixels each of which comprises a photodiode PD, a detection portion N and a transfer transistor QT for transferring the charges accumulated in the photodiode PD to the detection portion N, wherein the gate voltage of the transfer transistor QT when the charges are accumulated in the photodiode PD is set to a negative.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A solid-state image pickup device including: a plurality of pixels each comprising (1) a photodiode, (2) a detection portion and (3) a transfer transistor for transferring charges accumulated in said photodiode to said detection portion, wherein, an overflow path for discharging charges overflowing from said photodiode is formed in a bulk out of a channel portion of said transfer transistor and discharges the charges in a depth direction of a substrate, said overflow path is formed of a first conductive type semiconductor region formed on the surface of a n-type semiconductor region in an area extending from the portion just below said photodiode to a semiconductor substrate, and said area is formed of the second conductive type semiconductor region having an impurity concentration lower than that of a semiconductor well region or the p-type semiconductor region.
2. The solid-state image pickup device as claimed in claim 1 , wherein said overflow path is formed in the area between said photodiode and said detection portion, and said area is formed of an n-type semiconductor region having an impurity concentration lower than that of a semiconductor well region or a p-type semiconductor region.
3. The solid-state image pickup device as claimed in claim 1 , wherein said overflow path is formed in an area extending from the portion just below said photodiode and the area between said photodiode and said detection portion to a semiconductor substrate, and said area is formed of an n-type semiconductor region having an impurity concentration lower than that of a semiconductor well region or a p-type semiconductor region.
Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.
July 11, 2007
April 14, 2009
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