Patentable/Patents/US-7624772
US-7624772

Load lock apparatus, processing system and substrate processing method

PublishedDecember 1, 2009
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

A load lock apparatus including a carry port provided on a side of a carry-in/out section for carrying a substrate in/out from/to the outside, and a carry port provided on a side of a processing section for processing the substrate, includes: a temperature controlling plate for controlling a temperature of the substrate, the temperature controlling plate configured including a plate body made of a porous material and a temperature controlling gas supply path for supplying a temperature controlling gas controlled in temperature to the plate body. The temperature controlling gas passes through the plate body, blows out from a surface of the plate body, and is supplied to the substrate.

Patent Claims
22 claims

Legal claims defining the scope of protection, as filed with the USPTO.

1

1. A load lock apparatus including a carry port provided on a side of a carry-in/out section for carrying a substrate in/out from/to the outside, and a carry port provided on a side of a processing section for processing the substrate, said apparatus comprising: a first temperature controlling plate for controlling a temperature of the substrate carried in said load lock apparatus; and a second temperature controlling plate, wherein said first temperature controlling plate is placed on a front surface side of the substrate and said second temperature controlling plate is placed on a rear surface side of the substrate, wherein each of said first temperature controlling plate and said second temperature controlling plate comprises a plate body made of a porous carbon and a temperature controlling gas supply path for supplying a temperature controlling gas controlled in temperature to said plate body, wherein a surface of said plate body is provided with a permeable protection film, wherein the temperature controlling gas passes through said plate body, blows out from the surface of said plate body, and is supplied to the substrate, wherein an upper surface and an outer side surface of said plate body of said first temperature controlling plate are covered with a non-permeable protection material, and wherein said non-permeable protection material extending to a point below a lower surface of said plate body and said permeable protection film.

2

2. The load lock apparatus as set forth in claim 1 , wherein said first temperature controlling plate and/or said second temperature controlling plate are/is capable of being relatively brought close to or away from the substrate.

3

3. The load lock apparatus as set forth in claim 1 , wherein said second temperature controlling plate is provided with an electrostatic attraction electrode for electrostatically attracting the substrate.

4

4. A load lock apparatus including a carry port provided on a side of a carry-in/out section for carrying a substrate in/out from/to the outside, and a carry port provided on a side of a processing section for processing the substrate, said apparatus comprising: a first temperature controlling plate for controlling a temperature of the substrate carried in said load lock apparatus; and a second temperature controlling plate, wherein said first temperature controlling plate is placed on a front surface side of the substrate and said second temperature controlling plate is placed on a rear surface side of the substrate, wherein each of said first temperature controlling plate and said second temperature controlling plate comprises a plate body made of a porous carbon, a temperature controller provided in said plate body, and a gas supply path for supplying a gas to said plate body, wherein a surface of said plate body is provided with a permeable protection film, wherein the gas is controlled in temperature when passing through said plate body temperature-controlled by said temperature controller, blows out from the surface of said plate body, and is supplied to the substrate, wherein an upper surface and an outer side surface of said plate body of said first temperature controlling plate are covered with a non-permeable protection material, and wherein said non-permeable protection material extending to a point below a lower surface of said plate body and said permeable protection film.

5

5. The load lock apparatus as set forth in claim 4 , wherein said first temperature controlling plate and/or said second temperature controlling plate are/is capable of being relatively brought close to or away from the substrate.

6

6. The load lock apparatus as set forth in claim 4 , wherein said second temperature controlling plate is provided with an electrostatic attraction electrode for electrostatically attracting the substrate.

7

7. A substrate processing system comprising a processing section for processing a substrate; a carry-in/out section for carrying the substrate in/out; and a load lock section provided between said processing section and said carry-in/out section, wherein said load lock section comprises a first load lock apparatus including a carry port provided on a side of said carry-in/out section for carrying the substrate in/out from/to the outside, and a carry port provided on a side of said processing section for processing the substrate; and a second load lock apparatus including a carry port provided on a side of said carry-in/out section for carrying the substrate in/out from/to the outside, and a carry port provided on a side of said processing section for processing the substrate, each of said first load lock apparatus and said second load lock apparatus comprising a first temperature controlling plate for controlling a temperature of the substrate carried in said load lock apparatus, and comprising a second temperature controlling plate, wherein said first temperature controlling plate is placed on a front surface side of the substrate and said second temperature controlling plate is placed on a rear surface side of the substrate, wherein each of said first temperature controlling plate and said second temperature controlling plate comprises a plate body made of a porous carbon and a temperature controlling gas supply path for supplying a temperature controlling gas controlled in temperature to said plate body, wherein a surface of said plate body is provided with a permeable protection film, wherein the temperature controlling gas passes through said plate body, blows out from a surface of said plate body, and is supplied to the substrate, wherein an upper surface and an outer side surface of said plate body of said first temperature controlling plate are covered with a non-permeable protection material, and wherein said non-permeable protection material extending to a point below a lower surface of said plate body and said permeable protection film.

8

8. The substrate processing system as set forth in claim 7 , wherein said load lock section comprises said first load lock apparatus and said second load lock apparatus stacked one on the other.

9

9. A substrate processing system comprising a processing section for processing a substrate; a carry-in/out section for carrying the substrate in/out; and a load lock section provided between said processing section and said carry-in/out section, wherein said load lock section comprises a first load lock apparatus including a carry port provided on a side of said carry-in/out section for carrying the substrate in/out from/to the outside, and a carry port provided on a side of said processing section for processing the substrate; and a second load lock apparatus including a carry port provided on a side of said carry-in/out section for carrying the substrate in/out from/to the outside, and a carry port provided on a side of said processing section for processing the substrate, each of said first load lock apparatus and said second load lock apparatus comprising a first temperature controlling plate for controlling a temperature of the substrate carried in said load lock apparatus, and comprising a second temperature controlling plate, wherein said first temperature controlling plate is placed on a front side of the substrate and said second temperature controlling plate is placed on a rear side of the substrate, wherein each of said first temperature controlling plate and said second temperature controlling plate of said first load lock apparatus comprises a first plate body made of a porous carbon and a first temperature controlling gas supply path for supplying a temperature controlling gas controlled in temperature to said first plate body, a surface of said first plate body being provided with a permeable protection film, the temperature controlling gas passing through said first plate body, blowing out from a surface of said first plate body, and being supplied to the substrate, wherein each of said first temperature controlling plate and said second temperature controlling plate of said second load lock apparatus comprises a second plate body made of porous carbon, a second temperature controller provided in said second plate body, and a second gas supply path for supplying a gas to said second plate body, a surface of said second plate body being provided with a permeable protection film, the gas being controlled in temperature when passing through said second plate body temperature-controlled by said second temperature controller, blowing out from the surface of said second plate body, and being supplied to the substrate, wherein an upper surface and an outer side surface of said plate body of said first temperature controlling plate are covered with a non-permeable protection material, and wherein said non-permeable protection material extends to a point below a lower surface of said plate body and said permeable protection film.

10

10. The substrate processing system as set forth in claim 9 , wherein said load lock section comprises said first load lock apparatus and said second load lock apparatus stacked one on the other.

11

11. A substrate processing system comprising a processing section for processing a substrate; a carry-in/out section for carrying the substrate in/out; and a load lock section provided between said processing section and said carry-in/out section, wherein said load lock section comprises a first load lock apparatus including a carry port provided on a side of said carry-in/out section for carrying the substrate in/out from/to the outside, and a carry port provided on a side of said processing section for processing the substrate; and a second load lock apparatus including a carry port provided on a side of said carry-in/out section for carrying the substrate in/out from/to the outside, and a carry port provided on a side of said processing section for processing the substrate, each of said first load lock apparatus and said second load lock apparatus comprising a first temperature controlling plate for controlling a temperature of the substrate carried in said load lock apparatus, and comprising a second temperature controlling plate, wherein said first temperature controlling plate is placed on a front surface side of the substrate and said second temperature controlling plate is placed on a rear surface side of the substrate, wherein each of said first temperature controlling plate and said second temperature controlling plate of said first load lock apparatus and said second load lock apparatus comprises a plate body made of a porous carbon, a temperature controller provided in said plate body, and a gas supply path for supplying a gas to said plate body, wherein the gas is controlled in temperature when passing through said plate body temperature-controlled by said temperature controller, blows out from a surface of said plate body, and is supplied to the substrate, wherein an upper surface and an outer side surface of said plate body of said first temperature controlling plate are covered with a non-permeable protection material, and wherein said non-permeable protection material extending to a point below a lower surface of said plate body and said permeable protection film.

12

12. The substrate processing system as set forth in claim 11 , wherein said load lock section comprises said first load lock apparatus and said second load lock apparatus stacked one on the other.

13

13. The load lock apparatus as set forth in claim 1 , wherein said first temperature controlling plate is an upper surface heating plate, and said second temperature controlling plate is a lower surface heating plate.

14

14. The load lock apparatus as set forth in claim 1 , wherein said first temperature controlling plate is an upper surface cooling plate, and said second temperature controlling plate is a lower surface cooling plate.

15

15. The load lock apparatus as set forth in claim 4 , wherein said first temperature controlling plate is an upper surface heating plate, and said second temperature controlling plate is a lower surface heating plate.

16

16. The load lock apparatus as set forth in claim 4 , wherein said first temperature controlling plate is an upper surface cooling plate, and said second temperature controlling plate is a lower surface cooling plate.

17

17. The substrate processing system as set forth in claim 7 , wherein said first temperature controlling plate is an upper surface heating plate, and said second temperature controlling plate is a lower surface heating plate.

18

18. The substrate processing system as set forth in claim 7 , wherein said first temperature controlling plate is an upper surface cooling plate, and said second temperature controlling plate is a lower surface cooling plate.

19

19. The substrate processing system as set forth in claim 9 , wherein said first temperature controlling plate is an upper surface heating plate, and said second temperature controlling plate is a lower surface heating plate.

20

20. The substrate processing system as set forth in claim 9 , wherein said first temperature controlling plate is an upper surface cooling plate, and said second temperature controlling plate is a lower surface cooling plate.

21

21. The substrate processing system as set forth in claim 11 , wherein said first temperature controlling plate is an upper surface heating plate, and said second temperature controlling plate is a lower surface heating plate.

22

22. The substrate processing system as set forth in claim 11 , wherein said first temperature controlling plate is an upper surface cooling plate, and said second temperature controlling plate is a lower surface cooling plate.

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Patent Metadata

Filing Date

April 14, 2006

Publication Date

December 1, 2009

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Cite as: Patentable. “Load lock apparatus, processing system and substrate processing method” (US-7624772). https://patentable.app/patents/US-7624772

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