A method and apparatus for thermally processing a substrate is provided. A substrate is disposed within a processing chamber configured for thermal processing by directing electromagnetic energy toward a surface of the substrate. An energy blocker is provided to block at least a portion of the energy directed toward the substrate. The blocker prevents damage to the substrate from thermal stresses as the incident energy approaches an edge of the substrate.
Legal claims defining the scope of protection, as filed with the USPTO.
1. An apparatus for processing a substrate in a processing chamber, comprising: a substrate support configured to position a substrate for processing; an energy source configured to direct electromagnetic energy toward the substrate support; and one or more energy blockers configured to block at least a portion of the electromagnetic energy from reaching a peripheral portion of the substrate while exposing a central portion of the substrate to the electromagnetic energy, wherein at least one of the energy blockers is a shadow ring.
2. The apparatus of claim 1 , wherein at least one of the energy blockers is opaque.
3. The apparatus of claim 1 , wherein the shadow ring comprises one or more tabs for engaging a lifting mechanism.
4. The apparatus of claim 3 , wherein at least one of the tabs has one or more recesses for engaging a lifting mechanism.
5. The apparatus of claim 1 , wherein the shadow ring comprises one or more recesses for mating with pins on the substrate support.
6. The apparatus of claim 1 , wherein a portion of the shadow ring extends above the substrate support and is spaced apart therefrom.
7. The apparatus of claim 1 , wherein the shadow ring comprises one or more pins for mating with one or more recesses on the substrate support.
8. The apparatus of claim 1 , wherein the substrate support is an edge ring.
9. The apparatus of claim 1 , wherein the shadow ring comprises at least two detachable parts.
10. The apparatus of claim 3 , wherein the lifting mechanism comprises one or more lift pins configured to engage with the tabs.
11. The apparatus of claim 1 , wherein at least one of the energy blockers rests on the substrate support.
12. A method of processing a substrate in a processing chamber, comprising: using a substrate support to position the substrate in the processing chamber; directing electromagnetic energy toward at least a portion of the substrate; and blocking at least a portion of the electromagnetic energy from striking the edge of the substrate while exposing the center of the substrate to the electromagnetic energy, wherein blocking at least a portion of the electromagnetic energy comprises: positioning one or more energy blockers proximate the substrate; and engaging the substrate support with the one or more energy blockers, wherein engaging the substrate support with the one or more energy blockers comprises raising the substrate support to contact the one or more energy blockers and lifting the one or more energy blockers.
13. The method of claim 12 , wherein the one or more energy blockers is opaque.
14. A method of processing a substrate in a processing chamber, comprising: using a substrate support to position the substrate in the processing chamber; directing electromagnetic energy toward at least a portion of the substrate; and blocking at least a portion of the electromagnetic energy from striking the edge of the substrate while exposing the center of the substrate to the electromagnetic energy, wherein blocking at least a portion of the electromagnetic energy comprises positioning one or more energy blockers proximate the substrate, and wherein the positioning comprises using alignment points to align the energy blocker with the substrate support.
Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.
February 15, 2008
July 13, 2010
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