Substrate drying apparatus, substrate cleaning apparatus and substrate processing system

1. A substrate processing system that is arranged adjacent to an exposure device that applies exposure processing by a liquid immersion method to a substrate, comprising: a substrate processing apparatus for applying predetermined processing to the substrate; and a substrate cleaning apparatus that is arranged between said substrate processing apparatus and said exposure device, wherein said substrate processing apparatus includes a substrate processing section including a photosensitive film formation unit that forms a photosensitive film made of a photosensitive material on the substrate, and a development processing unit that applies development processing to the substrate after exposure processing by said exposure device, and a first interface that transfers and receives the substrate between said substrate processing section and said substrate cleaning apparatus, and said substrate cleaning apparatus includes a cleaning processing section including a cleaning processing unit that applies cleaning processing using a cleaning liquid to the substrate after formation of the photosensitive film by photosensitive film formation unit and before exposure processing by said exposure device, and a first transport unit, and a second interface including a second transport unit to transfer and receive the substrate between said cleaning processing section and said exposure device, wherein said first transport unit is configured to transport the substrate among said first interface, said cleaning processing unit and said second interface, and said second transport unit is configured to transport the substrate between said cleaning processing section and said exposure device.

2. The substrate processing system according to claim 1 , wherein said cleaning processing unit further applies drying processing to the substrate after the cleaning processing.

3. The substrate processing system according to claim 2 , wherein said cleaning processing unit includes a substrate holding device that holds the substrate substantially horizontally, a rotation-drive device that rotates the substrate held by said substrate holding device around an axis perpendicular to the substrate, a cleaning liquid supplier that supplies a cleaning liquid onto the substrate held by said substrate holding device, and an inert gas supplier that supplies an inert gas onto the substrate after the cleaning liquid is supplied onto the substrate by said cleaning liquid supplier.

4. The substrate processing system according to claim 3 , wherein said inert gas supplier supplies the inert gas so that the cleaning liquid on the substrate supplied by said cleaning liquid supplier moves outwardly from the center of the substrate and the cleaning liquid is removed from the substrate.

5. The substrate processing system according to claim 3 , wherein said cleaning processing unit further includes a rinse liquid supplier that supplies a rinse liquid onto the substrate after the cleaning liquid is supplied by said cleaning liquid supplier and before the inert gas is supplied by said inert gas supplier.

6. The substrate processing system according to claim 5 , wherein said inert gas supplier supplies the inert gas so that the rinse liquid on the substrate supplied by said rinse liquid supplier moves outwardly from the center of the substrate and the rinse liquid is removed from the substrate.

7. The substrate processing system according to claim 1 , wherein said second transport unit includes third and fourth holders that each hold the substrate, and is configured to hold and transport the substrate after the cleaning processing and before the exposure processing with said third holder to said exposure device, and to hold and transport the substrate after the exposure processing and before the development processing with said fourth holder from said exposure device.

8. The substrate processing system according to claim 7 , wherein said fourth holder is provided below said third holder.

9. The substrate processing system according to claim 1 , wherein said substrate processing apparatus further includes a protective film formation unit that forms a protective film for protecting said photosensitive film, and said cleaning processing unit is configured to apply the cleaning processing using the cleaning liquid to the substrate after the formation of the protective film by said protective film formation unit and before the exposure processing.

10. The substrate processing system according to claim 9 , wherein said substrate processing apparatus further includes a removal unit that removes said protective film before the exposure processing by the exposure device.

11. The substrate processing system according to claim 1 , wherein said substrate processing apparatus further includes an anti-reflection film formation unit that forms an anti-reflection film on the substrate before the formation of the photosensitive film by said photosensitive film formation unit.

12. The substrate processing system according to claim 1 , wherein said first transport unit includes first and second holders that each hold the substrate, and is configured to hold and transfer the substrate after the formation of the photosensitive film and before the exposure processing with said first holder to said cleaning processing unit, hold and transfer the substrate after the cleaning processing and before the exposure processing with said first holder from said cleaning processing unit, and hold and transfer the substrate after the exposure processing and before the development processing with said second holder from said second interface.

13. The substrate processing system according to claim 12 , wherein said second holder is provided below said first holder.