Patentable/Patents/US-8092760
US-8092760

Scanning arm for semiconductor wafer pollutant measurement apparatus and scanning device using the same

PublishedJanuary 10, 2012
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

Provided is a scanning arm which moves to collect pollutants on the surface of a semiconductor wafer, for use in a semiconductor wafer pollutant measurement apparatus, and a scanning device using the same. The scanning arm includes: an X-axis portion; a Z-axis portion which is perpendicularly installed with the X-axis portion so as to move forward and backward along the X-axis portion; and a Y-axis portion which is perpendicularly installed with the Z-axis portion so as to move up and down with respect to the Z-axis portion.

Patent Claims
1 claims

Legal claims defining the scope of protection, as filed with the USPTO.

1

1. A scanning device for a semiconductor wafer pollutant measurement apparatus, the scanning device comprising: a scanning arm comprising an X-axis portion, a Z-axis portion which is perpendicularly installed with the X-axis portion so as to move forward and backward along the X-axis portion, and a Y-axis portion which is perpendicularly installed with the Z-axis portion so as to move up and down with respect to the Z-axis portion, wherein the X-axis portion, the Y-axis portion, and the Z-axis portion comprises a linear motion guide and a screw bar in an external casing, respectively, in which a slider is combined with the screw bar by a ball bushing combination so that the slider moves according to rotation of the screw bar; a scanning nozzle including: a nozzle main body; a support that supports the nozzle main body, the support comprises, a second connector which is connected with an inner slider of the Y-axis portion, a first connector which is perpendicularly connected with the second connector, and a mount portion which is horizontally extended from the first connector and on which the nozzle is inserted and mounted; and a pump connector to which a predetermined pumping power is transferred, wherein the scanning nozzle inhales a scan solution from a reagent solution bottle to then discharge a reagent scan solution on the surface of a wafer which is located on a scan stage and simultaneously keep an inhalation condition and move along the surface of the wafer, to then inhale and keep the scan solution including pollutants stuck on the wafer surface, and to thereafter move to an analyzer after inhalation to thereby discharge the scan solution; a first connection bracket that is horizontally fixed to the Y-axis portion; a second connection bracket which is installed perpendicularly with respect to the first connection bracket; and a main bracket which is installed horizontally with respect to the second connection bracket; and a dryer attached to the main bracket and including the lamp main body having a built-in halogen lamp, a diffusion plate which diffuses downstream light of the lamp main body, and a socket which makes the lamp main body and the diffusion plate mounted in an inner space; and a syringe pumping portion attached to the x-axis portion, the syringe pumping portion having a syringe pump body whose load moves up and down according to ascending and descending operations in an inner cylinder to thereby apply a pressure and inhale and discharge the reagent solution via selection of inhalation and discharge hoses which are connected with an upper valve, respectively.

Classification Codes (CPC)

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Patent Metadata

Filing Date

September 8, 2008

Publication Date

January 10, 2012

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Cite as: Patentable. “Scanning arm for semiconductor wafer pollutant measurement apparatus and scanning device using the same” (US-8092760). https://patentable.app/patents/US-8092760

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