A magnetoresistive element includes a first reference layer having magnetic anisotropy perpendicular to a film surface, and an invariable magnetization, a recording layer having a stacked structure formed by alternately stacking magnetic layers and nonmagnetic layers, magnetic anisotropy perpendicular to a film surface, and a variable magnetization, and an intermediate layer provided between the first reference layer and the recording layer, and containing a nonmagnetic material. The magnetic layers include a first magnetic layer being in contact with the intermediate layer and a second magnetic layer being not in contact with the intermediate layer. The first magnetic layer contains an alloy containing cobalt (Co) and iron (Fe), and has a film thickness larger than that of the second magnetic layer.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A magnetoresistive element comprising: a first reference layer having magnetic anisotropy perpendicular to a film surface, and an invariable magnetization; a recording layer having a stacked structure formed by alternately stacking magnetic layers and nonmagnetic layers, magnetic anisotropy perpendicular to a film surface, and a variable magnetization; and a first intermediate layer provided between the first reference layer and the recording layer, and containing a nonmagnetic material, wherein the magnetic layers include a first magnetic layer being in contact with the first intermediate layer and a second magnetic layer being not in contact with the first intermediate layer, and the first magnetic layer contains an alloy containing cobalt (Co) and iron (Fe), and has a film thickness larger than that of the second magnetic layer.
2. The element according to claim 1 , wherein at least one of the first magnetic layer and the second magnetic layer contains an alloy Co 100-x Fe x containing cobalt (Co) and iron (Fe), for which x≧20 at %.
3. The element according to claim 1 , wherein the first magnetic layer contains an alloy (Co 100-x —Fe x ) 100-y B y containing cobalt (Co), iron (Fe), and boron (B), for which x≧20 at %, and 0<y≦30 at %.
4. The element according to claim 1 , wherein at least one of the nonmagnetic layers included in the recording layer contains an alloy containing palladium (Pd) and gold (Au).
5. The element according to claim 1 , one of the nonmagnetic layers which is farthest from the first intermediate layer contains gold (Au).
6. The element according to claim 1 , wherein the first intermediate layer has an NaCl structure and orients in a (100) plane.
7. The element according to claim 1 , wherein the first intermediate layer contains magnesium oxide.
8. The element according to claim 1 , wherein the first magnetic layer has one of a cubic structure and a tetragonal structure and orients in a (100) plane.
9. The element according to claim 1 , wherein the first reference layer contains a ferromagnetic alloy having an L1 0 structure.
10. The element according to claim 1 , wherein the first reference layer contains at least one element selected from a group consisting of iron (Fe), cobalt (Co), and nickel (Ni), and at least one element selected from a group consisting of palladium (Pd) and platinum (Pt).
11. The element according to claim 1 , further comprising an interface layer provided between the first reference layer and the first intermediate layer, the interface layer containing an alloy (Co 100-x —Fe x ) 100-y B y containing cobalt (Co), iron (Fe), and boron (B), for which x≧20 at %, and 0<y≦30 at %.
12. The element according to claim 11 , wherein the interface layer has one of a cubic structure and a tetragonal structure and orients in a (100) plane.
13. The element according to claim 1 , further comprising: a second reference layer having magnetic anisotropy perpendicular to a film surface, and invariable magnetization; and a second intermediate layer provided between the second reference layer and the recording layer, and containing a nonmagnetic material.
14. The element according to claim 13 , wherein the second intermediate layer contains gold (Au).
15. The element according to claim 13 , wherein at least one of the first reference layer and the second reference layer includes a third magnetic layer, a fourth magnetic layer, and a first nonmagnetic layer provided between the third magnetic layer and the fourth magnetic layer, and the third magnetic layer and the fourth magnetic layer are antiferromagnetically coupled.
16. The element according to claim 15 , wherein the first nonmagnetic layer contains one element selected from a group consisting of ruthenium (Ru), osmium (Os), rhenium (Re), and rhodium (Rh), or an alloy containing at least one element selected from a group consisting of ruthenium (Ru), osmium (Os), rhenium (Re), and rhodium (Rh).
17. A magnetoresistive element comprising: a reference layer having magnetic anisotropy perpendicular to a film surface, and an invariable magnetization; a recording layer having a stacked structure formed by alternately stacking magnetic layers and nonmagnetic layers, magnetic anisotropy perpendicular to a film surface, and a variable magnetization; and an intermediate layer provided between the reference layer and the recording layer, and containing a nonmagnetic material, wherein the magnetic layers include a first magnetic layer being in contact with the intermediate layer and a second magnetic layer being not in contact with the intermediate layer, the first magnetic layer contains an alloy which has a composition Co 2 XY, and has a film thickness larger than that of the second magnetic layer, X is at least one element selected from the group consisting of vanadium (V), chromium (Cr), manganese (Mn), iron (Fe), nickel (Ni), and copper (Cu), and Y is at least one element selected from the group consisting of aluminum (Al), gallium (Ga), indium (In), silicon (Si), germanium (Ge), tin (Sn), and antimony (Sb).
18. The element according to claim 17 , wherein at least one of the first magnetic layer and the second magnetic layer contains an alloy Co 100-x Fe x containing cobalt (Co) and iron (Fe), for which x≧20 at %.
19. The element according to claim 17 , wherein at least one of the nonmagnetic layers included in the recording layer contains an alloy containing palladium (Pd) and gold (Au).
20. The element according to claim 17 , wherein one of the nonmagnetic layers which is farthest from the intermediate layer contains gold (Au).
21. The element according to claim 17 , wherein the first magnetic layer has one of a cubic structure and a tetragonal structure and orients in a (100) plane.
22. A magnetic memory comprising a memory cell including a magnetoresistive element, and a first electrode and a second electrode sandwiching the magnetoresistive element to supply a current to the magnetoresistive element, the magnetoresistive element comprising: a first reference layer having magnetic anisotropy perpendicular to a film surface, and an invariable magnetization; a recording layer having a stacked structure formed by alternately stacking magnetic layers and nonmagnetic layers, magnetic anisotropy perpendicular to a film surface, and a variable magnetization; and a first intermediate layer provided between the first reference layer and the recording layer, and containing a nonmagnetic material, wherein the magnetic layers include a first magnetic layer being in contact with the first intermediate layer and a second magnetic layer being not in contact with the first intermediate layer, and the first magnetic layer contains an alloy containing cobalt (Co) and iron (Fe), and has a film thickness larger than that of the second magnetic layer.
23. The memory according to claim 22 , further comprising: a first interconnection electrically connected to the first electrode; a second interconnection electrically connected to the second electrode; and a write circuit electrically connected to the first interconnection and the second interconnection, and configured to supply the current to the magnetoresistive element in two directions.
24. The memory according to claim 23 , wherein the memory cell includes a selection transistor electrically connected between the second electrode and the second interconnection.
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September 18, 2008
January 17, 2012
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