A method of forming a conformal dielectric film having Si—N bonds on a semiconductor substrate by plasma enhanced chemical vapor deposition (PECVD) includes: introducing a nitrogen- and hydrogen-containing reactive gas and an additive gas into a reaction space inside which a semiconductor substrate is placed; applying RF power to the reaction space; and introducing a hydrogen-containing silicon precursor in pulses into the reaction space wherein a plasma is excited, thereby forming a conformal dielectric film having Si—N bonds on the substrate.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A method of forming a conformal dielectric film having Si—N bonds on a semiconductor substrate by plasma enhanced chemical vapor deposition (PECVD), which comprises: introducing a nitrogen- and/or hydrogen-containing reactive gas and a rare gas into a reaction space inside which the semiconductor substrate is placed; applying RF power to the reaction space thereby exciting and maintaining a plasma; and while introducing the reactive gas and the rare gas and maintaining the plasma without interruption, introducing a precursor comprising a hydrogen-containing silicon gas in multiple pulses each having a less than 5-second duration into the reaction space thereby forming a conformal dielectric film having Si—N bonds on the substrate.
2. The method according to claim 1 , wherein the hydrogen-containing silicon precursor has a formula of Si α H β X γ , wherein α, β and γ are integers (γ includes zero), wherein X comprises N, F and/or C m H n , wherein m and n are integers.
3. The method according to claim 1 , wherein the hydrogen-containing silicon precursor is a liquid at room temperature and vaporized upstream of the reaction space.
4. The method according to claim 1 , wherein the pulse duration is equal to or shorter than the interval between pulses.
5. The method according to claim 4 , wherein the hydrogen-containing silicon precursor is introduced in pulses of a duration of approximately 0.1 sec to 1.0 sec with an interval between pulses of approximately 0.1 sec to 3.0 sec.
6. The method according to claim 1 , wherein the reactive gas comprises at least one of a mixture of N 2 and H 2 , a mixture of NH 3 and H 2 , and a nitrogen-boron-hydrogen gas.
7. The method according to claim 1 , wherein the rare gas comprises a mixture of helium and argon or a mixture of helium and krypton.
8. The method according to claim 1 , wherein the conformal dielectric film is a silicon nitride film.
9. The method according to claim 1 , wherein the hydrogen-containing silicon gas has no carbon atom in its molecule and constitutes a first precursor, and the precursor further comprises a hydrocarbon-containing gas as a second precursor.
10. The method according to claim 9 , wherein the first precursor and the second precursor are introduced in pulses at the same timing.
11. The method according to claim 10 , wherein the pulse duration of the second precursor is different from that of the first precursor.
12. The method according to claim 9 , wherein the conformal dielectric film is a carbon-doped silicon nitride film.
13. A method of forming dielectric films having Si—N bonds on a semiconductor substrate by plasma enhanced chemical vapor deposition (PECVD), which comprises: (i) introducing a nitrogen- and/or hydrogen-containing reactive gas and an rare gas into a reaction space inside which the semiconductor substrate is placed; (ii) applying RF power to the reaction space thereby exciting and maintaining a plasma; (iii) while introducing the reactive gas and the rare gas and maintaining the plasma without interruption, introducing as a first precursor a hydrogen-containing silicon gas in multiple pulses each having a less than a 5-second duration into the reaction space, thereby forming a first dielectric film having Si—N bonds on the substrate; and (iv) forming a second dielectric film having Si—N bonds on the substrate by repeating steps (i) to (iii), wherein step (iii) further comprises introducing a second precursor in pulses while introducing the first precursor in pulses at the same timing, thereby increasing wet etching resistance of the second dielectric film as compared with that of the first dielectric film, said second precursor having more hydrocarbons in its molecule than the first precursor.
14. The method according to claim 13 , wherein step (iv) further comprises prolonging the pulse duration of the second precursor relative to that of the first precursor.
15. The method according to claim 13 , wherein step (iv) further comprises reducing nitrogen gas flow relative to that for the first dielectric film.
16. A method of forming dielectric films having Si—N bonds on a semiconductor substrate by plasma enhanced chemical vapor deposition (PECVD), which comprises: (i) introducing a nitrogen- and/or hydrogen-containing reactive gas and an rare gas into a reaction space inside which the semiconductor substrate is placed; (ii) applying RF power to the reaction space thereby exciting and maintaining a plasma; (iii) while introducing the reactive gas and the rare gas and maintaining the plasma without interruption, introducing a first precursor and a second precursor each in multiple pulses each having a less than a 5-second duration at the same timing into the reaction space, thereby forming a first dielectric film having Si—N bonds on the substrate, said first precursor being a hydrogen-containing silicon gas, said second precursor having more hydrocarbons than the first precursor; and (iv) forming a second dielectric film having Si—N bonds on the substrate by repeating steps (i) to (iii), wherein step (iii) further comprises introducing another second precursor in pulses while introducing the first and second precursors in pulses at the same timing, thereby changing wet etching resistance of the second dielectric film as compared with that of the first dielectric film.
17. The method according to claim 16 , wherein step (iv) further comprises changing the pulse duration of the another second precursor relative to that of the second precursor.
18. The method according to claim 16 , wherein step (iv) further comprises changing nitrogen gas flow relative to that for the second dielectric film.
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September 3, 2009
March 27, 2012
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