Method for megasonic processing of an article

1. A method of cleaning semiconductor wafers comprising: supporting a semiconductor wafer in a substantially horizontal orientation; supporting a probe having an elongated forward portion and a rear portion adjacent to but spaced from a first surface of the semiconductor wafer so that the elongated forward portion extends in a substantially non-normal orientation relative to the first surface of the semiconductor wafer; rotating the semiconductor wafer; applying a fluid to the first surface of the semiconductor wafer so as to form a film of the fluid between at least a portion of the elongated forward portion and the first surface of the semiconductor wafer; and transmitting acoustical energy that is generated by a transducer that is acoustically coupled to the rear portion of the probe into the film of the fluid via the elongated forward portion, the acoustical energy loosening particles from the first surface of the semiconductor wafer.

2. The method of claim 1 wherein the elongated forward portion is a cylindrical rod.

3. The method of claim 1 wherein the rear portion has a cross-section that is greater than a cross-section of the elongated forward portion.

4. The method of claim 3 wherein the acoustical energy that is generated by the transducer is focused as it is transmitted through the probe from the rear portion to the elongated forward portion.

5. The method of claim 1 wherein the semiconductor wafer is supported in a gaseous atmosphere when the acoustical energy is transmitted to the film of the fluid.

6. The method of claim 1 wherein the fluid is applied to the first surface of the semiconductor wafer by a nozzle.

7. The method of claim 1 further comprising supporting the probe in a cantilever fashion.

8. The method of claim 1 wherein the acoustical energy is megasonic energy.

9. The method of claim 1 wherein the elongated forward portion comprises a central axis, the probe supported so that the central axis extends in the substantially non-normal orientation relative to the first surface of the semiconductor wafer.

10. The method of claim 1 wherein the substantially non-normal orientation is substantially parallel to the first surface of the semiconductor wafer.

11. A method of processing semiconductor wafers comprising: supporting the semiconductor wafer substantially horizontally; positioning a rod-like probe above an upper surface of the semiconductor wafer in an orientation other than normal to the upper surface of the substrate; applying a fluid to the upper surface of the semiconductor wafer so that a film of the fluid is formed between at least a portion of the rod-like probe and the upper surface of the semiconductor wafer; and vibrating the rod-like probe to transmit energy to the upper surface of the semiconductor wafer via the film of the fluid to loosen particles on the upper surface of the semiconductor wafer.

12. The method of claim 11 further comprising vibrating the rod-like probe at one or more megasonic frequencies to apply megasonic energy to the upper surface of the semiconductor wafer via the film of the fluid.

13. The method of claim 12 further comprising rotating the semiconductor wafer while the megasonic energy is being applied to the upper surface of the semiconductor wafer.

14. The method of claim 12 wherein the rod-like probe is vibrated by a transducer that is acoustically coupled to a rear portion of the probe.

15. The method of claim 12 further comprising supporting the rod-like probe above the upper surface of the substrate in a cantilever fashion.

16. A method of cleaning semiconductor wafers comprising: supporting a semiconductor wafer in a substantially horizontal orientation; supporting a probe having a rod-like forward portion and a rear portion above an upper surface of the semiconductor wafer so that the rod-like forward portion extends in a substantially non-normal orientation relative to the upper surface of the semiconductor wafer; rotating the semiconductor wafer while maintaining the substantially horizontal orientation; applying a fluid to the upper surface of the semiconductor wafer so as to form a film of the fluid between at least a portion of the rod-like forward portion and the upper surface of the semiconductor wafer; and transmitting acoustical energy that is generated by a transducer that is acoustically coupled to the rear portion of the probe into the film of the fluid via the rod-like forward portion.

17. A method of processing semiconductor wafers comprising: supporting a semiconductor wafer in a substantially horizontal orientation; supporting a probe in a cantilevered fashion so that at least a portion of an elongated forward portion of the probe is adjacent to but spaced from a first surface of the semiconductor wafer; rotating the semiconductor wafer; applying a liquid to the first surface of the semiconductor wafer so as to form a film of the liquid between at least the portion of the elongated forward portion and the first surface of the semiconductor wafer; and transmitting acoustical energy that is generated by a transducer that is acoustically coupled to a rear portion of the probe into the film of the liquid via the elongated forward portion, the acoustical energy loosening particles from the first surface of the semiconductor wafer.

18. The method of claim 17 wherein the elongated forward portion is a solid cylindrical rod formed of quartz; and wherein the rear portion has a cross-section that is greater than a cross-section of the elongated forward portion.

19. The method of claim 17 wherein the semiconductor wafer is supported in a gaseous atmosphere when the acoustical energy is transmitted to the film of the liquid; wherein the liquid is applied to the first surface of the semiconductor wafer by a nozzle; and wherein the acoustical energy is megasonic energy.

20. The method of claim 17 wherein the probe is supported in the cantilevered fashion so that the elongated forward portion is substantially parallel to the first surface of the semiconductor wafer.