(Problem) To provide a method for producing silicon nitride films by vapor deposition that, while employing trisilylamine as precursor, can produce silicon nitride films that exhibit excellent film properties and can do so at relatively low temperatures and relatively high growth rates. (Solution) Method for producing silicon nitride film, said method being characterized by feeding gaseous trisilylamine and gaseous nitrogen source comprising at least two amine-type compounds selected from amine-type compounds with formula (1) NR1R2R3 (R1, R2, and R3 are each independently selected from hydrogen and C1-6 hydrocarbyl) into a reaction chamber that holds at least one substrate and forming silicon nitride film on said at least one substrate by reacting the trisilylamine and said nitrogen source.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A CVD method for producing silicon nitride film, said method being characterized by feeding gaseous trisilylamine and gaseous nitrogen source comprising NH 3 and NMe 3 into a reaction chamber that holds at least one substrate and forming silicon nitride film on said at least one substrate by reacting the trisilylamine and said nitrogen source in a CVD method, wherein the silicon nitride film contains ≦5 atomic % C.
2. The method described in claim 1 , wherein the reaction between the trisilylamine gas and nitrogen source is carried out at 300° C. to 900° C.
3. The method described in claim 1 , wherein a pressure of 0.1 torr to 1000 torr is established within the reaction chamber.
4. The method of claim 1 , wherein inert dilution gas is also fed to the reaction chamber.
Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.
August 17, 2005
January 22, 2013
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