Patentable/Patents/US-8363377
US-8363377

Electrostatic chuck and apparatus having the same

PublishedJanuary 29, 2013
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

An electrostatic chuck and an apparatus having the electrostatic chuck are provided. The electrostatic chuck may attract a substrate during a substrate assembling process for manufacturing a flat display panel. An elastic layer made of an elastic material may be provided in a base part of the electrostatic chuck, thus preventing non-uniform stress from being distributed on the substrate due to external force, therefore maintaining the flatness of the substrate and improving the quality of assembled substrates. The electrostatic chuck may include an electrostatic force generating part provided on an upper surface of the base part, the force generating part including an insulating layer, an electrode layer, a dielectric layer. The base part may be provided with the elastic layer made of the elastic material having elastic restoring force.

Patent Claims
9 claims

Legal claims defining the scope of protection, as filed with the USPTO.

1

1. An electrostatic chuck, comprising: a base part including an elastic layer made of an elastic material and having an elastic restoring force, and a non-elastic layer made of Aluminum positioned directly on an upper surface of the elastic layer; and an electrostatic force generating part positioned directly on an upper surface of the non-elastic layer of the base part, opposite a lower surface thereof contacting the elastic layer, wherein the electrostatic force generating part includes: an insulating layer positioned directly on the upper surface of the non-elastic layer; an electrode layer positioned directly on an upper surface of the insulating layer; and a dielectric layer positioned directly on an upper surface of the electrode layer.

2

2. The electrostatic chuck of claim 1 , wherein an exposed upper surface of the dielectric layer defines a substrate receiving surface.

3

3. The electrostatic chuck of claim 1 , wherein the elastic layer of the base part absorbs an external force imparted thereon such that the force is not transmitted to the electrostatic force generating part.

4

4. The electrostatic chuck of claim 1 , wherein the elastic layer is made of a urethane material.

5

5. The electrostatic chuck of claim 1 , wherein the elastic layer deforms to absorb an external force imparted thereon while the non-elastic layer retains its shape such that the external force is not transmitted to the electrostatic force generating part.

6

6. An electrostatic chuck for a substrate assembling apparatus that is used to assemble substrates of a flat display panel, the electrostatic chuck comprising: a base part including an elastic layer made of an elastic material having an elastic restoring force and a non-elastic layer adhered directly on an upper surface of the elastic layer and made of Aluminum; and an electrostatic force generating part adhered directly on an upper surface of the non-elastic layer of the base part, wherein the elastic layer of the base part absorbs an external force imparted thereon such that the external force is not transmitted to the electrostatic force generating part.

7

7. The electrostatic chuck of claim 6 , wherein the electrostatic force generating part comprises: an insulating layer adhered directly on the upper surface of the non-elastic layer of the base part; an electrode layer adhered directly on an upper surface of the insulating layer; and a dielectric layer adhered directly on an upper surface of the electrode layer and having an exposed surface that forms a substrate receiving surface.

8

8. The electrostatic chuck of claim 6 , wherein the elastic layer is made of a urethane material.

9

9. The electrostatic chuck of claim 6 , the wherein the elastic layer deforms to absorb an external force imparted thereon while the non-elastic layer retains its shape such that the external force is not transmitted to the electrostatic force generating part.

Classification Codes (CPC)

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Patent Metadata

Filing Date

October 22, 2008

Publication Date

January 29, 2013

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Cite as: Patentable. “Electrostatic chuck and apparatus having the same” (US-8363377). https://patentable.app/patents/US-8363377

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