Patentable/Patents/US-8395151
US-8395151

Method of manufacturing thin film transistor, thin film transistor, and display unit

PublishedMarch 12, 2013
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

A thin film transistor having (a) an oxide semiconductor film including a channel region composed of an oxide semiconductor, and a source electrode region and a drain electrode region that are composed of the same oxide semiconductor as that of the channel region and have a higher carrier density than that of the channel region; (b) a gate insulating film; and (c) a gate electrode.

Patent Claims
2 claims

Legal claims defining the scope of protection, as filed with the USPTO.

1

1. A thin film transistor comprising: an oxide semiconductor film including (a) a source electrode region, (b) a drain electrode region and (c) a channel region between the source electrode and drain electrode regions; a gate insulating film; and a gate electrode, wherein, each of the source electrode region and the drain electrode region has a carrier density that is higher than that of the channel region, and the carrier density of the channel region is from 1.0*10 13 /cm 3 to 1.0*10 18 /cm 3 inclusive.

2

2. A display unit comprising: a thin film transistor; and a pixel, wherein, the thin film transistor comprises an oxide semiconductor film, the oxide semiconductor film including a (a) a source electrode region (b) a drain electrode region, and (c) a channel region between the source electrode and drain electrode regions, each of the source electrode region and the drain electrode region has a carrier density that is higher than that of the channel region, and the carrier density of the channel region is from 1.0*10 13 /cm 3 to 1.0*10 18 /cm 3 inclusive.

Classification Codes (CPC)

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Patent Metadata

Filing Date

March 16, 2012

Publication Date

March 12, 2013

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