A low dielectric constant, a low dielectric loss tangent, and heat resistance are achieved. An active ester resin that has a resin structure produced by reacting a polyfunctional phenolic compound (a1) with a monofunctional aromatic carboxylic acid or its chloride (a2) and an aromatic dicarboxylic acid or its chloride (a3). The polyfunctional phenolic compound (a1) is represented by structural formula (1) below:
Legal claims defining the scope of protection, as filed with the USPTO.
1. A active ester resin comprising a resin structure produced by reacting a polyfunctional phenolic compound (a1) with a monofunctional aromatic carboxylic acid or its chloride (a2) and an aromatic dicarboxylic acid or its chloride (a3) in such a manner that an amount of the monofunctional aromatic carboxylic acid or its chloride (a2) is 0.46 to 0.95 moles and an amount of the aromatic dicarboxylic acid or its chloride (a3) is 0.27 to 0.025 moles per mole of phenolic hydroxyl groups of the polyfunctional phenolic compound (a1), the polyfunctional phenolic compound (a1) being represented by structural formula (1) below: (wherein Ar represents a benzene ring, a naphthalene ring, a benzene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms, or a naphthalene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms; X represents a methylene group, a divalent cyclic aliphatic hydrocarbon group, a phenylene dimethylene group, or a biphenylene-dimethylene group; and n represents the number of repeating units and an average thereof is in a range of 0.5 to 10).
2. The active ester resin according to claim 1 , wherein a softening point is in a range of 70° C. to 140° C.
3. The active ester resin according to claim 1 that has a carbonyloxy structure in a proportion of 180 to 400 g/eq.
4. A method for producing an active ester resin, the method comprising reacting a polyfunctional phenolic compound (a1) with a monofunctional aromatic carboxylic acid or its chloride (a2) and an aromatic dicarboxylic acid or its chloride (a3) in such a manner that an amount of the monofunctional aromatic carboxylic acid or its chloride (a2) is 0.46 to 0.95 moles and an amount of the aromatic dicarboxylic acid or its chloride (a3) is 0.27 to 0.025 moles per mole of phenolic hydroxyl groups of the polyfunctional phenolic compound (a1), the polyfunctional phenolic compound (a1) being represented by structural formula (1) below: (wherein Ar represents a benzene ring, a naphthalene ring, a benzene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms, or a naphthalene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms; X represents a methylene group, a divalent cyclic aliphatic hydrocarbon group, a phenylene dimethylene group, or a biphenylene-dimethylene group; and n represents the number of repeating units and an average thereof is in a range of 0.5 to 10).
5. The method for producing an active ester resin according to claim 4 , wherein the polyfunctional phenolic compound (a1) is reacted with the monofunctional aromatic carboxylic acid or its chloride (a2) and the aromatic dicarboxylic acid or its chloride (a3) in the presence of an basic catalyst.
6. A curable resin composition comprising an active ester resin (A) and an epoxy resin (B) as essential components, the active ester resin (A) having a resin structure produced by reacting a polyfunctional phenolic compound (a1) with a monofunctional aromatic carboxylic acid or its chloride (a2) and an aromatic dicarboxylic acid or its chloride (a3) in such a manner that an amount of the monofunctional aromatic carboxylic acid or its chloride (a2) is 0.46 to 0.95 moles and an amount of the aromatic dicarboxylic acid or its chloride (a3) is 0.27 to 0.025 moles per mole of phenolic hydroxyl groups of the polyfunctional phenolic compound (a1), the polyfunctional phenolic compound (a1) being represented by structural formula (1) below: (wherein Ar represents a benzene ring, a naphthalene ring, a benzene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms, or a naphthalene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms; X represents a methylene group, a divalent cyclic aliphatic hydrocarbon group, a phenylene dimethylene group, or a biphenylene-dimethylene group; and n represents the number of repeating units and an average thereof is in a range of 0.5 to 10).
7. The curable resin composition according to claim 6 , wherein the active ester resin (A) has a softening point in a range of 70° C. to 140° C.
8. The curable resin composition according to claim 6 , wherein the active ester resin (A) has a carbonyloxy structure in a proportion of 180 to 400 g/eq.
9. A cured product produced by curing the curable resin composition according to claim 6 .
10. A semiconductor encapsulating material comprising a thermosetting resin composition containing an inorganic filler (C) in a proportion of 70% to 95% by mass in the composition in addition to the active ester resin (A) and the epoxy resin (B) of the curable resin composition according to claim 6 .
11. A pre-preg produced by impregnating a reinforcement substrate with the curable resin composition according to claim 6 , the curable resin composition being diluted with an organic solvent, and semi-curing the resulting impregnated substrate.
12. A circuit board produced by diluting the curable resin composition according to claim 6 with an organic solvent to prepare a varnish, shaping the varnish into a plate, and molding the plate and a copper foil under heat and pressure.
13. A build-up film produced by applying the curable resin composition according to claim 6 to a base film and drying the film, the curable resin composition being diluted with an organic solvent.
14. A cured product produced by curing the curable resin composition according to claim 7 .
15. A cured product produced by curing the curable resin composition according to claim 8 .
16. A semiconductor encapsulating material comprising a thermosetting resin composition containing an inorganic filler (C) in a proportion of 70% to 95% by mass in the composition in addition to the active ester resin (A) and the epoxy resin (B) of the curable resin composition according to claim 7 .
17. A semiconductor encapsulating material comprising a thermosetting resin composition containing an inorganic filler (C) in a proportion of 70% to 95% by mass in the composition in addition to the active ester resin (A) and the epoxy resin (B) of the curable resin composition according to claim 8 .
18. A pre-preg produced by impregnating a reinforcement substrate with the curable resin composition according to claim 7 , the curable resin composition being diluted with an organic solvent, and semi-curing the resulting impregnated substrate.
19. A pre-preg produced by impregnating a reinforcement substrate with the curable resin composition according to claim 8 , the curable resin composition being diluted with an organic solvent, and semi-curing the resulting impregnated substrate.
20. A circuit board produced by diluting the curable resin composition according to claim 7 with an organic solvent to prepare a varnish, shaping the varnish into a plate, and molding the plate and a copper foil under heat and pressure.
21. A circuit board produced by diluting the curable resin composition according to claim 8 with an organic solvent to prepare a varnish, shaping the varnish into a plate, and molding the plate and a copper foil under heat and pressure.
22. A build-up film produced by applying the curable resin composition according to claim 7 to a base film and drying the film, the curable resin composition being diluted with an organic solvent.
23. A build-up film produced by applying the curable resin composition according to claim 8 to a base film and drying the film, the curable resin composition being diluted with an organic solvent.
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May 25, 2012
July 29, 2014
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