At least one N-well implant having a different doping level is formed in a silicon substrate by first etching the substrate with an alignment target for aligning future process masks thereto. This alignment target is outside of any active device area. By using at least one N-well implant having a different doping level in combination with the substrate, a graded junction in the drift area of a metal oxide semiconductor (MOS) field effect transistor (FET) can be created and a pseudo Ldd structure may be realized thereby.
Legal claims defining the scope of protection, as filed with the USPTO.
1. A method for fabricating a high voltage (HV) metal oxide semiconductor (MOS) field effect transistor (FET) device, said method comprising the steps of: forming a zero layer ( 222 ) on a P-substrate ( 202 ) by etching an alignment target ( 220 ) on a surface of the P-substrate ( 202 ) and outside of active device areas of the P-substrate ( 202 ); forming a lightly doped N-well ( 204 a ) in a portion of the P-substrate ( 202 ) by implant; forming a doped N-well ( 204 b ) in a portion of the lightly doped N-well ( 204 a ) by implant; forming field oxides ( 214 ) over certain portions of the P-substrate ( 202 ); forming a gate oxide ( 216 ) over a portion of the lightly doped N-well ( 204 a ) and a portion of the P-substrate ( 202 ); forming a polysilicon gate ( 218 ) over the gate oxide ( 216 ); forming a heavily doped N + region ( 204 c ) in a portion of the doped N-well ( 204 b ) and another heavily doped N + region ( 212 ) in another portion of the P-substrate ( 202 ) by implant; and adjusting lengths of the lightly doped arid doped N-wells ( 204 a and 204 b ) to reduce high field effects of the MOSFET device.
2. The method according to claim wherein the steps of forming comprise using masks aligned with the alignment target ( 220 ).
3. The method according to claim 1 , wherein a drain connection is made to the heavily doped N + region ( 204 c ), a gate connection is made to the polysilicon gate ( 218 ), and a source connection is made to the another heavily doped N + region ( 212 ).
4. The method according to claim 1 , wherein a plurality of HV MOSFET devices are formed.
5. The method according to claim 1 , wherein the lightly doped N-well ( 204 a ) and doped N-well ( 204 b ) form a graded junction in a drift area of the MOSFET device.
6. The method according to claim 1 , further comprising the steps of adjusting lengths of the lightly doped and doped N-wells ( 204 a and 204 b ) to reduce on resistance of the MOSFET device.
7. A method for fabricating a high voltage (HV) metal oxide semiconductor (MOS) field effect transistor (FET) device, said method comprising the steps of: forming a zero layer ( 422 ) on a lightly doped N + -substrate ( 402 ) by etching an alignment target ( 420 ) on a surface of the lightly doped N + -substrate ( 402 ) and outside of active device areas of the lightly doped N+-substrate ( 402 ); forming an N-well ( 404 a ) in a portion of the lightly doped N + -substrate ( 402 ) by implant, wherein the N-well ( 404 a ) is more heavily doped than the lightly doped N+-substrate ( 402 ); forming field oxides ( 414 ) over certain portions of the lightly doped N + -substrate ( 402 ); forming a gate oxide ( 416 ) over a portions of the lightly doped N + -substrate ( 402 ); forming a polysilicon gate ( 418 ) over the gate oxide ( 416 ); forming a P-type region ( 424 ) in a portion of the lightly doped N + -substrate ( 402 ) by implant; forming a heavily doped N + region ( 404 b ) in a portion of the N-well ( 404 a ) and another heavily doped N + region ( 412 ) in a portion of the P-type region ( 424 ) by implant; forming a heavily doped P+ region ( 426 ) in a portion of the P-type region ( 424 ) by implant; and adjusting a length of the N-well ( 404 a ) to reduce high field effects of the MOSFET device.
8. The method according to claim 7 , wherein the steps of forming comprise using masks aligned with the alignment target ( 420 ).
9. The method according to claim 7 , wherein a drain connection is made to the heavily doped N + region ( 404 b ), a gate connection is made to the polysilicon gate ( 418 ), and a source connection is made to the another heavily doped N + region ( 412 ).
10. The method according to claim 7 , wherein a plurality of HV MOSFET devices are formed.
11. The method according to claim 7 , wherein the N-well ( 404 a ) and lightly doped N − -substrate ( 402 ) form a graded junction in a drift area of the MOSFET device.
12. The method according to claim 7 , further comprising the step of adjusting a length of the N-well ( 404 a ) to reduce on resistance of the MOSFET device.
13. A method for fabricating a high voltage (HV) metal oxide semiconductor (MOS) field effect transistor (FET) device, said method comprising the steps of: forming a zero layer on a P-substrate by etching an alignment target on a surface of the substrate and outside of active device areas of the substrate; forming a lightly doped N-well in a portion of the P-substrate by implant; forming a doped N-well in a portion of the lightly doped N-well by implant; forming field oxides over certain portions of the substrate, wherein at least one field oxide bridges over a junction between the substrate and the N-well; forming a gate oxide over portions of the substrate wherein the gate oxide abuts against said at least one field oxide; forming a polysilicon gate over the gate oxide; forming a source region in a portion of the substrate by implant; forming a heavily doped N + region in a portion of the N-well by implant; and adjusting lengths of the lightly doped and doped N-wells to reduce high field effects of the MOSFET device.
14. The method according to claim 13 , wherein forming the source region comprises: forming another heavily doped N+ region in another portion of the P-substrate by implant.
15. The method according to claim 14 , wherein the another heavily doped N+ region is located between gate oxide and another field oxide of said field oxides.
16. The method according to claim 13 , wherein the polysilicon gate extends over the field oxide that abuts against the gate oxide.
17. The method according to claim 13 , wherein the steps of forming comprise using masks aligned with the alignment target.
18. The method according to claim 13 , wherein a drain connection is made to the heavily doped N + region, a gate connection is made to the polysilicon gate, and a source connection is made to the source region.
19. The method according to claim 13 , wherein a plurality of HV MOSFET devices are formed.
20. The method according to claim 13 , wherein the lightly doped N-well and doped N-well form a graded junction in a drift area of the MOSFET device.
21. The method according to claim 13 , further comprising the steps of adjusting lengths of the lightly doped and doped N-wells to reduce on resistance of the MOSFET device.
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July 20, 2012
February 24, 2015
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