A method of the detection of particle contamination on a semiconductor wafer is provides which includes examining an area of the semiconductor wafer by a metrology system comprising a scatterometry or ellipsometry/reflectometry tool to obtain measured metrology data, comparing the measured metrology data with reference metrology data and determining the presence of particle contamination in the examined area of the semiconductor wafer based on the comparison of the measured metrology data with the reference metrology data.
Legal claims defining the scope of protection, as filed with the USPTO.
Claim text for this patent isn't available yet.
Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.
October 25, 2013
July 28, 2015
Browse 5M+ US patents with plain-English claim translations and AI-generated analysis.