Method for producing a wafer provided with chips

1. Method for producing a product wafer, the method including steps of: bonding a first side of the product wafer to a first rigid carrier wafer with a first intermediate layer, the first intermediate layer including one first adhesion layer applied at least on the edge side of the first side of the product wafer, the first adhesion layer made of a first material, processing a second side of the product wafer opposite to the first side by application of chips to the second side, bonding the second side of the product wafer to a second rigid carrier wafer with a second intermediate layer, the second intermediate layer including: one second adhesion layer applied at least on the edge side of the second side of the product wafer, the second adhesion layer being made of a second material wherein the first adhesion layer and the second adhesion layer are made from different materials such that both rigid carrier wafers bonded to the product wafer can be separated selectively from the product wafer, after both the first rigid carrier wafer and the second rigid carrier wafer are bonded to the product wafer, applying a first force to the combination of the first rigid carrier wafer, the second rigid carrier wafer and the product wafer wherein the first rigid carrier wafer and the first intermediate layer are separated from the product wafer, and after the first rigid carrier wafer and the first intermediate layer are separated from the product wafer, applying a second force to the second rigid carrier wafer wherein the second rigid carrier wafer and the second intermediate layer are separated from the product wafer.

2. Method as claimed in claim 1 , wherein the first adhesion layer has a bonding force that is smaller than the bonding force of the second adhesion layer.

3. Method as claimed in claim 1 , wherein a contact area between the first adhesion layer and the product wafer and/or the first rigid carrier wafer is smaller than the contact are between the second adhesion layer and the product wafer and/or the second rigid carrier wafer.

4. Method as claimed in claim 1 , wherein said step of applying a first force includes exposing that first adhesion layer and the second adhesion layer to a first solvent wherein the first adhesion layer is at least partially dissolved by the first solvent, while the second adhesion layer is at least largely inert with reference to the first solvent.

5. Method as claimed in claim 1 , wherein said step of applying a first force includes exposing the first adhesion layer and the second adhesion layer to a predetermined temperature wherein the first adhesion layer is at least partially dissolved and the second adhesion layer is at least largely unchanged so that the separation of the first carrier wafer can be effected before separation of the second carrier wafer.

6. Method as claimed in claim 1 , wherein said step of applying a first force includes exposing the first adhesion layer and the second adhesion layer to a light source of a predetermined intensity and/or wavelength wherein the light source acts selectively on the first adhesion layer and/or the second adhesion layer.

7. Method as claimed in claim 1 , wherein the first adhesion layer has a shear strength that is less than a shear strength of the second adhesion layer.

8. Method as claimed in claim 1 , wherein the first and/or the second adhesion layer are made annular, especially in the region of the periphery of the product wafer.

9. Method as claimed in claim 1 , wherein between the first carrier wafer and the first intermediate layer a first partial coating applied especially on the first carrier wafer is applied for reducing the bonding force/adhesion force in the region of the first partial coating and/or between the second carrier wafer and the second intermediate layer a second partial coating applied especially on the second carrier wafer is applied for reducing the bonding force/adhesion force in the region of the second partial coating.

10. Method as claimed in claim 1 , wherein the first force is equal to the second force.

11. Method for producing a product wafer, the method including steps of bonding a first side of the product wafer to a first rigid carrier wafer with a first intermediate layer, the first intermediate layer including one first adhesion layer applied at least on the edge side of the first side of the product wafer, the first adhesion layer made of a first material, processing a second side of the product wafer opposite to the first side by application of chips to the second side, bonding the second side of the product wafer to a second rigid carrier wafer with a second intermediate layer, the second intermediate layer including: one second adhesion layer applied at least on the edge side of the second side of the product wafer and made of a second material, wherein a contact area between the first adhesion layer and the first rigid carrier wafer and/or the product wafer is less than a contact area between the second adhesion layer and the second rigid carrier wafer and/or the product wafer such that both rigid carrier wafers bonded to the product wafer can be separated selectively from the product wafer, after both the first rigid carrier wafer and the second rigid carrier wafer are bonded to the product wafer, applying a first force to the combination of the first rigid carrier wafer, the second rigid carrier wafer and the product wafer wherein the first rigid carrier wafer and the first intermediate layer are separated from the product wafer, and after the first rigid carrier wafer and the first intermediate layer are separated from the product wafer, applying a second force to the second rigid carrier wafer wherein the second rigid carrier wafer and the second intermediate layer are separated from the product wafer.

12. Method as claimed in claim 11 , wherein the first and/or the second adhesion layer are made annular, especially in the region of the periphery of the product wafer.

13. Method as claimed in claim 11 , wherein the first material and the second material are the same.

14. Method for producing a product wafer, the method including steps of: bonding a first side of the product wafer to a first rigid carrier wafer with a first intermediate layer, the first intermediate layer including one first adhesion layer applied at least on the edge side of the first side of the product wafer, the first adhesion layer made of a first material, processing a second side of the product wafer opposite to the first side by application of chips to the second side, bonding the second side of the product wafer to a second rigid carrier wafer with a second intermediate layer, the second intermediate layer including: one second adhesion layer applied at least on the edge side of the second side of the product wafer and made of a second material, wherein a thickness of the first adhesion layer is less than a thickness of the second adhesion layer such that both rigid carrier wafers bonded to the product wafer can be separated selectively from the product wafer, after both the first rigid carrier wafer and the second rigid carrier wafer are bonded to the product wafer, applying a first force to the combination of the first rigid carrier wafer, the second rigid carrier wafer and the product wafer wherein the first rigid carrier wafer and the first intermediate layer are separated from the product wafer, and after the first rigid carrier wafer and the first intermediate layer are separated from the product wafer, applying a second force to the second rigid carrier wafer wherein the second rigid carrier wafer and the second intermediate layer are separated from the product wafer.

15. Method as claimed in claim 14 , wherein the first and/or the second adhesion layer are made annular, especially in the region of the periphery of the product wafer.

16. Method as claimed in claim 14 , wherein the first material and the second material are the same.

17. Method as claimed in claim 1 , wherein both the first adhesion layer and the second adhesion layer are made of a polymer.

18. Method as claimed in claim 12 , wherein a ratio of a ring width of the first adhesion layer to a ring width of the second adhesion layer is between about 1/10 and 9/10.

19. Method as claimed in claim 14 , wherein a ratio of a thickness of the first adhesion layer to a thickness of the second adhesion layer is about 2/3.