Patentable/Patents/US-9257984
US-9257984

Multi-threshold circuitry based on silicon-on-insulator technology

PublishedFebruary 9, 2016
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

Multiple threshold voltage circuitry based on silicon-on-insulator (SOI) technology is disclosed which utilizes N-wells and/or P-wells underneath the insulator in SOI FETs. The well under a FET is biased to influence the threshold voltage of the FET. A PFET and an NFET share a common buried P-well or N-well. Various types of logic can be fabricated in silicon-on-insulator (SOI) technology using multiple threshold voltage FETs. Embodiments provide circuits including the advantageous properties of both low-leakage transistors and high-speed transistors.

Patent Claims
20 claims

Legal claims defining the scope of protection, as filed with the USPTO.

1

1. An apparatus for digital evaluation comprising: a plurality of transistors configured to form a logic gate where the plurality of transistors are formed in a silicon-on-insulator (SOI) semiconductor technology, wherein: the plurality of transistors include a plurality of PFETs; the plurality of transistors include a plurality of NFETs; a first PFET, from the plurality of PFETs, and a first NFET, from the plurality of NFETs, share a first buried well under an insulator in the silicon-on-insulator semiconductor technology; a second PFET, from the plurality of PFETs, and a second NFET, from the plurality of NFETs, share a second buried well under an insulator in the silicon-on-insulator semiconductor technology; and a first connection that biases the first buried well and a second connection that biases the second buried well wherein the first buried well is biased so that the first PFET or the first NFET has a low threshold voltage and the second buried well is biased so that the second PFET or the second NFET has a low threshold voltage.

2

2. The apparatus of claim 1 wherein transistors with the low threshold voltage are used for logical evaluation.

3

3. The apparatus of claim 1 wherein one of the first PFET or the first NFET has a high threshold voltage.

4

4. The apparatus of claim 1 wherein one of the second PFET or the second NFET has a high threshold voltage.

5

5. The apparatus of claim 1 wherein a PFET, from the plurality of PFETs, is in a buried well with an NFET, from the plurality of NFETs, and the PFET forms a header transistor.

6

6. The apparatus of claim 5 wherein the header transistor has a high threshold voltage as a result of biasing for the buried well.

7

7. The apparatus of claim 5 wherein the header transistor includes a source connection and a drain connection where the drain connection provides a virtual power supply rail.

8

8. The apparatus of claim 1 wherein an NFET, from the plurality of NFETs, is in a buried well with a PFET, from the plurality of PFETs, and the NFET forms a footer transistor.

9

9. The apparatus of claim 8 wherein the footer transistor has a high threshold voltage as a result of biasing for the buried well.

10

10. The apparatus of claim 9 wherein the footer transistor, with the high threshold voltage, limits current through the logic gate.

11

11. The apparatus of claim 8 wherein the footer transistor provides a virtual ground rail.

12

12. The apparatus of claim 1 wherein the logic gate implements a Boolean logic operation where the logic gate is part of a clocked Boolean logic circuit.

13

13. The apparatus of claim 1 wherein the logic gate implements a null convention logic (NCL) gate.

14

14. The apparatus of claim 13 further comprising a flash connection for the NCL gate where the NCL gate is a flash NCL gate.

15

15. The apparatus of claim 1 wherein biasing for the first buried well is changed dynamically.

16

16. The apparatus of claim 1 wherein biasing for the second buried well is changed dynamically.

17

17. The apparatus of claim 1 wherein the plurality of transistors includes a high threshold voltage PFET and a low threshold voltage PFET.

18

18. The apparatus of claim 1 wherein the plurality of transistors include one or more three-dimensional transistors.

19

19. A computer program product embodied in a non-transitory computer readable medium for implementation of a logical calculation apparatus comprising: code for designing a plurality of transistors to form a logic gate where the plurality of transistors are formed in a silicon-on-insulator (SOI) semiconductor technology, wherein: the plurality of transistors include a plurality of PFETs; the plurality of transistors include a plurality of NFETs; a first PFET, from the plurality of PFETs, and a first NFET, from the plurality of NFETs, share a first buried well under an insulator in the silicon-on-insulator semiconductor technology; a second PFET, from the plurality of PFETs, and a second NFET, from the plurality of NFETs, share a second buried well under an insulator in the silicon-on-insulator semiconductor technology; and a first connection that biases the first buried well and a second connection that biases the second buried well wherein the first buried well is biased so that the first PFET or the first NFET has a low threshold voltage and the second buried well is biased so that the second PFET or the second NFET has a low threshold voltage.

20

20. A computer system for implementation of a logical calculation apparatus comprising: a memory which stores instructions; one or more processors coupled to the memory wherein the one or more processors are configured to: design a plurality of transistors to form a logic gate where the plurality of transistors are formed in a silicon-on-insulator (SOI) semiconductor technology, wherein: the plurality of transistors include a plurality of PFETs; the plurality of transistors include a plurality of NFETs; a first PFET, from the plurality of PFETs, and a first NFET, from the plurality of NFETs, share a first buried well under an insulator in the silicon-on-insulator semiconductor technology; a second PFET, from the plurality of PFETs, and a second NFET, from the plurality of NFETs, share a second buried well under an insulator in the silicon-on-insulator semiconductor technology; and a first connection that biases the first buried well and a second connection that biases the second buried well wherein the first buried well is biased so that the first PFET or the first NFET has a low threshold voltage and the second buried well is biased so that the second PFET or the second NFET has a low threshold voltage.

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Patent Metadata

Filing Date

September 16, 2014

Publication Date

February 9, 2016

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