Patentable/Patents/US-9362255
US-9362255

Method for manufacturing a multilayer structure on a substrate

PublishedJune 7, 2016
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

The invention relates to a method for manufacturing a multilayer strucute on a first substrate, the method including: using the first substrate made of a first material having a Young's modulus Ev and a thickness ev, and using a second substrate covered by the multilayer structure, the second substrate being made of a second material having a Young's modulus Es that is different from the Young's modulus Ev and a thickness es, the thicknesses es and ev complying, plus or minus 10%, with the relation (I); molecularly bonding the first substrate and the multilayer structure together; and removing the second substrate.

Patent Claims
20 claims

Legal claims defining the scope of protection, as filed with the USPTO.

1

1. A method of manufacturing a multilayer structure on a first support, the method comprising the successive steps of: providing the first support made of a first material having a Young's modulus Ev and a thickness ev, and a second support covered with the multilayer structure, the second support being made of a second material having a Young's modulus Es different from Young's modulus Ev, and a thickness es, thicknesses es and ev verifying, to within 10%, relation: e s = E v E s ⁢ e v ; performing a molecular bonding between the first support and the multilayer structure; and removing the second support.

2

2. The manufacturing method of claim 1 , wherein the second support initially has a thickness greater than thickness es, the method further comprising, before the bonding step, thinning the second support down to thickness es.

3

3. The manufacturing method of claim 1 , wherein thicknesses es and ev are greater than 50 μm.

4

4. The manufacturing method of claim 1 , wherein the second material is single-crystal silicon.

5

5. The manufacturing method of claim 1 , wherein the first material is isolating.

6

6. The manufacturing method of claim 1 , wherein the first material is transparent.

7

7. The manufacturing method of claim 1 , wherein the first material is glass.

8

8. A support for a multilayer structure intended to be bonded to an additional support made of a first material having a Young's modulus Ev and a thickness ev, the support being made of a second material having a Young's modulus Es, different from Young's modulus Ev, and a thickness es verifying, to within 10%, relation: e s = E v E s ⁢ e v .

9

9. The support of claim 8 , wherein the second material is single-crystal silicon.

10

10. The manufacturing method of claim 2 , wherein thicknesses es and ev are greater than 50 μm.

11

11. The manufacturing method of claim 2 , wherein the second material is single-crystal silicon.

12

12. The manufacturing method of claim 3 , wherein the second material is single-crystal silicon.

13

13. The manufacturing method of claim 2 , wherein the first material is isolating.

14

14. The manufacturing method of claim 3 , wherein the first material is isolating.

15

15. The manufacturing method of claim 4 , wherein the first material is isolating.

16

16. The manufacturing method of claim 2 , wherein the first material is transparent.

17

17. The manufacturing method of claim 3 , wherein the first material is transparent.

18

18. The manufacturing method of claim 4 , wherein the first material is transparent.

19

19. The manufacturing method of claim 5 , wherein the first material is transparent.

20

20. The manufacturing method of claim 19 , wherein the first material is glass.

Classification Codes (CPC)

Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.

Patent Metadata

Filing Date

December 27, 2012

Publication Date

June 7, 2016

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Cite as: Patentable. “Method for manufacturing a multilayer structure on a substrate” (US-9362255). https://patentable.app/patents/US-9362255

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