An image sensor includes a substrate, photosensitive devices, a color filter layer, a micro-lens layer and an infrared filter layer. The photosensitive devices are disposed in the substrate. The color filter layer is disposed to cover the photosensitive devices. The micro-lens layer is disposed on the color filter layer. The infrared filter layer directly covers the micro-lens layer.
Legal claims defining the scope of protection, as filed with the USPTO.
1. An image sensor, comprising: a substrate; a plurality of photosensitive devices disposed in the substrate; an infrared color filter structure disposed to cover the photosensitive devices, wherein the infrared color filter structure comprises an infrared filter layer disposed over the substrate and a color filter layer disposed on the infrared filter layer; and a micro-lens layer disposed on the infrared color filter structure, wherein a refractive index of the color filter layer is equal to a square root of a product of a refractive index of the infrared filter layer and a refractive index of the micro-lens layer.
2. The image sensor of claim 1 , further comprising an anti-reflective coating layer disposed between the substrate and the infrared color filter structure.
3. The image sensor of claim 1 , wherein the infrared filter layer comprises a reflective infrared filter structure.
4. The image sensor of claim 3 , wherein the reflective infrared filter structure is a multi-film stacked structure.
5. The image sensor of claim 4 , wherein the multi-film stacked structure comprises a plurality of films, and the films of the multi-film stacked structure have different refractive indexes in an infrared region.
6. The image sensor of claim 1 , wherein the substrate is formed from silicon, carbon, germanium, gallium, arsenic, nitrogen, indium or phosphorus.
7. A method for manufacturing an image sensor, the method comprising: forming a plurality of photosensitive devices in a substrate; forming a color filter layer to cover the photosensitive devices; forming a micro-lens layer above the color filter layer; and forming an infrared filter layer above the substrate and adjacent to the color filter layer and/or the micro-lens layer, wherein the color filter layer is formed to have a refractive index which is equal to a square root of a product of a refractive index of the infrared filter layer and a refractive index of the micro-lens layer.
8. The method of claim 7 , wherein forming the infrared filter layer is performed to form the infrared filter layer under the color filter layer.
9. The method of claim 7 , further comprising forming an anti-reflective coating layer on the substrate before forming the color filter layer to form the anti-reflective coating layer between the substrate and the color filter layer.
10. The method of claim 7 , wherein the infrared filter layer is formed to comprise a reflective infrared filter structure.
11. The method of claim 10 , wherein the reflective infrared filter structure is formed to be a multi-film stacked structure.
12. The method of claim 11 , wherein the multi-film stacked structure is formed to comprise a plurality of films, and the films of the multi-film stacked structure have different refractive indexes in an infrared region.
13. The method of claim 7 , wherein the color filter layer is formed by using a coating process.
Cooperative Patent Classification codes for this invention. Click any code to explore related patents in that topic.
September 15, 2014
June 21, 2016
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