Patentable/Patents/US-9557169
US-9557169

Method for tracking defects on a photomask across repeated inspections

PublishedJanuary 31, 2017
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

This invention allows tracking of a defect across multiple inspections. The inventive solution translates every inspection record into a common set of fields that are first archived into a relational database. Then the defect coordinates from the inspection records of the same mask are all transformed into a common reference frame having the same origin and orientation with respect to the mask coordinate system. Following this, the defect having coordinates within a given tolerance distance are paired up and reported to the user.

Patent Claims

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Patent Metadata

Filing Date

March 13, 2013

Publication Date

January 31, 2017

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Cite as: Patentable. “Method for tracking defects on a photomask across repeated inspections” (US-9557169). https://patentable.app/patents/US-9557169

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