Patentable/Patents/US-9691975
US-9691975

Conductive bridging memory device

PublishedJune 27, 2017
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

A Conductive Bridge Random Access Memory (CBRAM) device comprising an insulating electrolyte element sandwiched between a cation supply electrode and a bottom electrode, whereby the conductivity σ of the cation provided by the cation supply electrode in the electrolyte element increases towards the bottom electrode.

Patent Claims
6 claims

Legal claims defining the scope of protection. Each claim is shown in both the original legal language and a plain English translation.

Claim 1

Original Legal Text

1. A Conductive Bridge Random Access Memory (CBRAM) device comprising: an insulating electrolyte element sandwiched between a cation supply metal electrode and a bottom electrode, wherein the conductivity σ of the cation provided by the cation supply electrode in the electrolyte element increases towards the bottom electrode, wherein the electrolyte element comprises a top layer of a first dielectric material stacked on a bottom layer of a second dielectric material, wherein the cation conductivity σ in the first dielectric material is lower than the cation conductivity σ the second dielectric material, wherein the cation supply electrode comprises Cu or Ag, wherein the bottom electrode comprises tungsten, and wherein the second dielectric material is a thermally grown tungsten oxide.

Plain English Translation

A Conductive Bridge Random Access Memory (CBRAM) device has an insulating electrolyte between a cation supply electrode (made of Cu or Ag) and a bottom electrode (made of tungsten). The electrolyte has two layers: a top layer of a first dielectric and a bottom layer of a second dielectric, with the cation conductivity being lower in the top layer. This means the cation conductivity in the electrolyte increases toward the bottom electrode. The bottom dielectric material is thermally grown tungsten oxide.

Claim 2

Original Legal Text

2. The CBRAM device of claim 1 , wherein the second dielectric material comprises a chalcogenide.

Plain English Translation

The CBRAM device, which has an insulating electrolyte between a cation supply electrode (made of Cu or Ag) and a bottom electrode (made of tungsten), and where the cation conductivity in the electrolyte increases towards the bottom electrode, where the electrolyte has two layers of dielectric material, includes a bottom dielectric material that comprises a chalcogenide.

Claim 3

Original Legal Text

3. The CBRAM device of claim 1 , wherein: the first dielectric material is an Alumina-oxide.

Plain English Translation

The CBRAM device, which has an insulating electrolyte between a cation supply electrode (made of Cu or Ag) and a bottom electrode (made of tungsten), and where the cation conductivity in the electrolyte increases towards the bottom electrode, where the electrolyte has two layers of dielectric material, includes a top dielectric material that is an alumina oxide.

Claim 4

Original Legal Text

4. The CBRAM device of claim 1 , wherein the cation supply electrode further comprises: a Tantalum or a Titanium-Tungsten liner in contact with the electrolyte element.

Plain English Translation

The CBRAM device, which has an insulating electrolyte between a cation supply electrode (made of Cu or Ag) and a bottom electrode (made of tungsten), and where the cation conductivity in the electrolyte increases towards the bottom electrode, where the electrolyte has two layers of dielectric material, includes a cation supply electrode that further comprises a Tantalum or a Titanium-Tungsten liner in contact with the electrolyte element. This liner helps improve the interface between the electrode and the electrolyte.

Claim 5

Original Legal Text

5. The CBRAM device of 1 , wherein the bottom electrode comprises tungsten and wherein the second dielectric material is crystalline tungsten oxide.

Plain English Translation

The CBRAM device, which has an insulating electrolyte between a cation supply electrode (made of Cu or Ag) and a bottom electrode (made of tungsten), and where the cation conductivity in the electrolyte increases towards the bottom electrode, where the electrolyte has two layers of dielectric material, includes a bottom electrode that comprises tungsten and a bottom dielectric material that is crystalline tungsten oxide.

Claim 6

Original Legal Text

6. A method for manufacturing the CBRAM device according to claim 1 , the method comprising: forming the bottom electrode; forming the electrolyte element on the bottom electrode; and forming the cation supply electrode on the electrolyte element, wherein the conductivity σ of the cation provided by the cation supply electrode in the electrolyte element increases towards the bottom electrode.

Plain English Translation

A method for manufacturing a CBRAM device, which has an insulating electrolyte between a cation supply electrode (made of Cu or Ag) and a bottom electrode (made of tungsten), and where the cation conductivity in the electrolyte increases towards the bottom electrode, where the electrolyte has two layers of dielectric material, includes forming the bottom electrode, forming the electrolyte element on the bottom electrode, and forming the cation supply electrode on the electrolyte element, ensuring that the cation conductivity increases towards the bottom electrode. This is achieved by using different dielectric materials for the electrolyte layers.

Classification Codes (CPC)

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Patent Metadata

Filing Date

December 1, 2015

Publication Date

June 27, 2017

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