Patentable/Patents/US-9733523
US-9733523

Exposure apparatus and exposure method using the same

PublishedAugust 15, 2017
Assigneenot available in USPTO data we have
Inventorsnot available in USPTO data we have
Technical Abstract

An exposure method includes loading a first substrate on a loading portion , the first substrate having a photo alignment agent which is coated on the first substrate, irradiating the first substrate by moving the first substrate in a first speed in a first direction to a working portion while loading a second substrate on the loading portion, the working portion having an ultra violet light source generating ultra violet ray to harden a photo alignment agent, simultaneously irradiating the first substrate and the second substrate by moving the first substrate and the second substrate in the first direction in the working portion, and unloading the first substrate from an unloading portion while irradiating the second substrate by moving the second substrate in the first direction in the working portion.

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Patent Metadata

Filing Date

May 28, 2014

Publication Date

August 15, 2017

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